Hitachi, Ltd.

Hitachi Chemical Company, Ltd.

Hitachi Service Engineering Co., Ltd.

Service Engineering Co. Ltd.

Noboru Suzuki

Takuya Fukuda

Naohiro Momma

Shigeru Takahashi

Tadasi Sonobe

Kazuo Suzuki

Yasuhiro Mochizuki

Takahiro Daikoku

Hisanao Ogata

Yoshinori Hakuraku

Manabu Ono

Teruyuki Nagayoshi

Kiyoshi Chiba

Kiyosi Chiba

A friction material composition containing a fibrous material, a binder and a friction adjusting agent, wherein the friction adjusting agent is secondary aggregates of an activated alumina being spherical and having a diameter of 10 to 300 &#x3bc;m, or an activated alumina having a specific surface area of 100 to 400 m/g and an average particle diameter of 1 to 200 &#x3bc;m. The composition can be used for producing a friction material which exhibits significant improvement with respect to fading phenomenon, without adversely affecting its characteristics of attacking to a disc rotor, which is the article mating therewith, and without marked reduction of the friction coefficient at an elevated temperature, and is capable of controlling the thickness of the sliding film formed on a frictionally sliding face and preventing a high frequency noise (grabbing chatter).

Friction material composition and friction material using the composition

A plasma treatment apparatus for forming a thin film on a substrate in a vacuum vessel includes a magnetic field generator which can be positioned inside or outside the vacuum vessel, and a microwave source. The magnetic field strength is controllable such that an electron cyclotron resonance (ECR) area is defined near the substrate. The magnetic field generator can be arranged so that plasma and reactive gas introduction ports are on the microwave introduction side of the ECR area and the substrate is on the opposite side of the ECR area. Alternatively, a gas introduction port can be positioned such that reactive gas is introduced into the ECR area or onto the substrate.

Apparatus for plasma treatment using electron cyclotron resonance

A plasma operation apparatus utilizes plasma generated by a microwave cooperative with a magnetic field as to perform a surface operation on a specimen such as semiconductor substrates, such as, for example, thin film deposition, etching, sputtering and plasma oxidation. The apparatus particularly takes advantage of electron cyclotron resonance and is suitable for performing highly efficient and high-quality plasma operations.

Plasma operation apparatus

In a magnetic refrigerator comprising working substances for the magnetic refrigeration and a magnetic field generating device which magnetizes and demagnetizes these working substances, this magnetic refrigerator is provided with a plurality of superconducting coils arranged around the outer periphery of a rotor, a plurality of working substances are arranged around the periphery of said rotor, and the rotor is rotated so that the strength of magnetic fields impressed on the working substances is varied.

Magnetic refrigerator

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Hitachi, Japan

Noboru Suzuki