Fujikura Kasei Co., Ltd.

Noboru Ohara

Masao Watanabe

Takashi Isogai

Kenji Kawai

Mitsuo Najima

Shuhei Kawabata

Hiroyuki Ishii

The object of the present invention is to provide a hard coating composition for a metal substrate, including a film-forming resin component which contains a urethane (meth)acrylate obtained by reacting a polyisocyanate compound, a polyol, and a (meth)acrylate monomer having a hydroxyl group, wherein the polyisocyanate compound is hydrogenated xylylene diisocyanate and/or dicyclohexylmethane diisocyanate.

Hard coating composition for metal substrate

A resin composition for an aqueous coating material that includes a propylene-butene resin component and/or propylene-ethylene-butene resin component (A), and a (meth)acrylic resin component (B), wherein the mass ratio between the propylene-butene resin component and/or propylene-ethylene-butene resin component (A) and the (meth)acrylic resin component (B) is within a range from 15:85 to 75:25. Also disclosed are a method for producing such a resin composition and an aqueous coating material. The present invention is able to provide a resin composition for an aqueous coating material that is useful as a binder within an aqueous coating material that uses no organic solvents or chlorine compounds, and yet exhibits excellent adhesion to polyolefin-based resins and is capable of forming a coating film that is resistant to discoloration and exhibits favorable resistance to the oils contained within gasoline, cosmetic products and foodstuffs and the like, and is also able to provide a method for producing the resin composition and an aqueous coating material that uses the resin composition.

Resin composition for aqueous coating material, method for producing the same, and aqueous coating material

A coating composition for a metal thin film for coating a vapor-deposited film or sputtered film provided on the surface of a base material, comprising: a coating film forming component containing 50% by weight or more of urethane(meth)acrylate that is a reaction product of hydrogenated xylene diisocyanate and/or hydrogenated diphenylmethane diisocyanate, polyol, and (meth)acrylate having a hydroxyl group.

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Saitama, Japan

Noboru Ohara