Mitsui Toatsu Chemicals, Incorporated

Mitsui Chemicals, Inc.

Mitsui Chemicals Tohcello, Inc.

Noboru Kawasaki

Kenichi Fujii

Katsuyoshi Sasagawa

Toshiyuki Suzuki

Koju Okazaki

Jun Kamada

Shinichi Usugi

Yoshiaki Noguchi

Nobuhiro Fukuda

Takuzo Aida

Shin Fukuda

Jin Kinoshita

Akimitsu Morimoto

Tomoyuki Okamura

Kouji Igarashi

Shigenobu Nakayama

Fumiharu Yamazaki

Isamu Yamamoto

Eiichi Noda

Yoko Tajiri

Yumi Gotoh

Takehiro Miyashita

Makoto Sukegawa

This semiconductor wafer surface protection film has a substrate layer A, an adhesive absorption layer B, and adhesive surface layer C, in the stated order. The adhesive absorption layer B comprises an adhesive composition containing a thermoset resin b1, said adhesive absorption layer B having a minimum value G'bmin of the storage elastic modulus G&#x2032;b in the range of 25&#xb0; C. to less than 250&#xb0; C. of 0.001 MPa to less than 0.1 MPa, a storage elastic modulus G&#x2032;b250 at 250&#xb0; C. of 0.005 MPa or above, and a temperature at which G&#x2032;bmin is exhibited of 50-150&#xb0; C. The adhesive surface layer C has a minimum value G&#x2032;cmin of the storage elastic modulus G&#x2032;c in the range of 25&#xb0; C. to less than 250&#xb0; C. of 0.03 MPa.

Semiconductor wafer surface protection film and method for manufacturing semiconductor device

An adhesive resin composition includes an expandable sticky polymer having a structure derived from a Meldrum's acid derivative, or a Meldrum's acid derivative represented by the following general formula (1) and an adhesive resin. 

Adhesive resin composition, laminate, and self-stripping method

A hydrophilic film that has high adhesion to inorganic materials and is safer and excellent in transparency and also exhibits both very high hydrophilicity and abrasion resistance, and a laminate including the hydrophilic film. The hydrophilic film is produced by applying a specific hydrophilic compound (c) having an acryloyl group and a potassium sulfonate group or the like to a surface of a layer formed from a mixture containing a silane compound (a) including one silicon atom, a mercapto group or the like, and at least one silicon-bonded group, and a silane compound (b) including at least four silicon-bonded groups and not including groups reactive with a carbon-carbon double bond, and allowing a reaction between at least a part of acryloyl groups contained in the hydrophilic compound (c) and at least a part of mercapto groups derived from the compound (a).

Hydrophilic film

The present invention provides: a composition including a polymer (i) which has a &#x2014;SOM group and an epoxy group, wherein M represents a hydrogen atom, an alkali metal, an alkaline earth metal or an ammonium ion, and a silane compound (ii) which has at least two hydroxy group(s), alkoxy group(s) or halogen atom(s) that are each bound to a silane atom; and a hydrophilic film obtained by curing the composition. The hydrophilic film of the present invention is excellent in its hydrophilicity, durability, abrasion resistance and weather resistance and has high antifogging, antifouling, antistatic and quick-drying (water evaporation) properties. Therefore, a variety of laminates in which the hydrophilic film of the present invention is laminated on a substrate can also be provided.

Composition and film comprising same

A laminate using a polymeric molded article as a substrate and having a light transparency, gas barrier properties and an excellent alkali resistance. The laminate is obtainable by carrying out a surface treatment to deposit an oxide of at least one metal selected from the metal elements of groups 2, 8, 9, 10 and 11 of the periodic table, and then forming a gas barrier layer such as oxides of silicon, nitrides of silicon and carbides of silicon on the treated surface. The gas barrier layer is not peeled off from the polymeric molded article even after being immersed in an alkali solution of pH 12 or more. The amount of the metal on the treated surface is preferably in the range of 5.times.10.sup.14 atoms/cm.sup.2 to 3.times.10.sup.16 atoms/cm.sup.2 in terms of the metal atoms per unit area. The practical performance of the laminate is not deteriorated during the patterning, by alkali etching, of a transparent conductive layer formed on the laminate.

Laminate and method for preparing same

Described are a high-speed polymerizable resin composition and a lens obtained from it. The composition comprises:

High-speed polymerizable resin composition and lenses obtained therefrom

A polymerizable monomer has the formula, ##STR1## where R.sub.5 and R.sub.6 are similar or dissimilar and are selected from group consisting of hydrogen and methyl, k is an integer of 2-10, and the isopropenyl substituent on the aromatic ring is in the p-position or m-position. The polymerizable monomer can be used to prepare a high hardness transparent resin which in turn can be used to prepare a laminated transparent plastic material.

Polymerizable monomer useful for the preparation of high hardness

A laminated transparent plastic material comprises a transparent resin material having a total visible light transmittance of at least 85% and a high hardness transparent resin layer of at least 0.2 mm thick having a pencil hardness of at least 4H, Rockwell M scale hardness of at least 100, and a total visible light transmittance of at least 85% overlying the surface of the transparent resin material, the laminated transparent plastic material having a bending modulus of elasticity of at least 350 kgf/mm.sup.2. A polymerizable monomer has the formula, ##STR1## where R.sub.5 and R.sub.6 are similar or dissimilar and are selected from group consisting of hydrogen and methyl, k is an integer of 2-10, and the isopropenyl substituent on the aromatic ring is in the p-position or m-position.

Laminated transparent plastic material and polymerizable monomer

The guanidine derivative represented by the formula [III], ##STR1## (commonly known under the name 'Cimetidine') is produced by reaction of the compound represented by the formula [I], ##STR2## with a compound represented by the formula [II], ##STR3## wherein R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5 and R.sub.6, is each hydrogen atom, a lower alkyl group, phenyl group, or a radical of --OR.sub.7 or --COOR.sub.7, in which R.sub.7 is hydrogen atom, a lower alkyl group or an alkali metal, followed by reaction with methylamine.

Process for producing a guanidine derivative

A process for producing 2-mercaptoethylamine hydrohalides of the general formula ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 are identical or different, and each represents a hydrogen atom, a lower alkyl group, a hydroxy-substituted lower alkyl group or a phenyl group, and X represents a halogen atom, which comprises reacting a 2-mercaptothiazoline of the general formula ##STR2## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 are as defined above, with a 2-halogenoethylamine hydrohalide of the general formula ##STR3## wherein R.sub.1, R.sub.2, R.sub.3, R.sub.4 and X are as defined above, in the presence of water.

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Sakura, Japan

Noboru Kawasaki