Applied Materials Israel Limited

Gm Global Technolgoy Operations, Inc.

Noam Zac

Shaul Cohen

Ron Katzir

Amit Batikoff

Lavi Jacov Shachar

Imry Kissos

Oren Longman

Ishai Schwarzband

Doron Girmonsky

Shalom Elkayam

Shay Attal

Mor Baram

Tal Furman

Guy Maoz

Lee Moldovan

Kfir Ben-Zikri

A motion monitor includes a lidar device, a controller, and a circuit. The lidar device is configured to perform scans of an environment proximate the ego vehicle to generate lidar point clouds related to one or more objects in the environment. The controller is configured to transform the lidar point clouds with location transform matrices to generate location point sets, aggregate the location point sets in a duration of interest to generate aggregated point sets, register the location point sets to the aggregated point sets to generate correction transform matrices, update the location transform matrices with the correction transform matrices to generate updated location transform matrices, and generate motion sets based on the updated location transform matrices. The circuit is configured to receive the motion sets.

Motion monitor using lidar registration

A spatial monitoring system employs a partial dimension iterative closest point analysis to provide improved accuracy for point cloud registration. The partial dimension iterative closest point analysis improves registration accuracy by performing optimization in accordance with an error magnitude of each dimension, wherein dimensions having large initial errors are significantly improved, and dimensions having high initial accuracy are further improved. The registration separately optimizes each dimension using surfaces with contributing information for the optimized dimension.

Method and system for determining a spatial transformation employing partial dimension iterative closest point

There are provided systems and methods of obtaining a segmented image of a semiconductor specimen, the image comprising first structural elements, obtaining a reference image of the semiconductor specimen, the reference image being based on design data and comprising second structural elements, determining, for at least one pair of elements including a first structural element and a corresponding second structural element, data Dinformative of a spatial transformation required in order to match the elements of the pair in accordance with a matching criterion, and determining at least one of data informative of a defect in the first structural element and data informative of edge roughness of the first structural element using at least D.

Determination of defects and/or edge roughness in a specimen based on a reference image

One or more metrology objects and one or more metrology operations may be identified. A design-based representation of a first metrology object of the one or more metrology objects may be received. Furthermore, an image-based representation of the first metrology object of the one or more metrology objects may be received where the one or more metrology operations include a first metrology operation associated with the first metrology object that is to be performed on the image-based representation of the first metrology object. The design-based representation of the first metrology object may be mapped with the image-based representation of the first metrology object. The first metrology operation may be performed based on the mapping.

Method of performing metrology operations and system thereof

A method for evaluating an object, the method may include acquiring, by a charged particle beam system, an image of an area of a reference object, wherein the area includes multiple instances of a structure of interest, and the structure of interest is of a nanometric scale; determining multiple types of attributes from the image; reducing a number of the attributes to provide reduced attribute information; generating guidelines, based on the reduced attribute information and on reference data, for evaluating the reduced attribute information; and evaluating an actual object by implementing the guidelines.

Evaluating an object

There are provided system and method of performing metrology operations related to a specimen. The method comprises: generating an examination recipe in accordance with a metrology application, the examination recipe specifying one or more metrology objects and one or more metrology operations related to the metrology application; obtaining an image-based representation of the specimen and a design-based representation of the specimen; mapping between the design-based representation of at least first metrology object and the image-based representation of at least first metrology object; and performing at least first metrology operation of the one or more metrology operations according to the examination recipe using the mapping, the at least first metrology operation specified as related to the at least first metrology object and to be performed on at least the image-based representation of the specimen.

There are provided system and method of performing metrology operations related to a specimen. The method comprises: accommodating definitions of metrology objects and metrology operations, at least one of the group consisting of the metrology objects and the metrology operations being defined using design data; accommodating a design-based representation and an image-based representation of the specimen, the design-based representation of the specimen comprising design-based representation of at least first metrology object, the image-based representation of the specimen comprising image-based representation of the at least first metrology object, the metrology operations including at least first metrology operation defined as related to the at least first metrology object and performed on at least the image-based representation of the specimen; mapping between the design-based representation and the image-based representation of the at least first metrology object; and performing the at least first metrology operation according to definition thereof using the mapping.

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Kfar Saba, Israel

Noam Zac