International Business Machines Corporation

Agency for Science, Technology and Research

Noah F Fine Nathel

James L Hedrick

Rudy J Wojtecki

Ekmini Anuja De Silva

Yi Yan Yang

Victoria A Piunova

Willy Chin

Zhi Xiang Voo

Noel Arellano

Techniques regarding star polymers with enhanced antimicrobial functionality are provided. For example, a polymer is provided that can comprise a core that can have a singlet oxygen generator and that can generate a singlet oxygen species upon irradiation with light. The polymer can also comprise a plurality of polycarbonate arms covalently bonded to the core. The plurality of polycarbonate arms can be degradable and can comprise a cation. Further, the plurality of polycarbonate arms can have antimicrobial functionality.

Star polymers with enhanced antimicrobial activity in response to light

A patterning method is described that utilizes self-assembled monolayers (SAMs) formed with hydroxamic acid compounds and area selective atomic layer deposition (ALD). In the examples, regions of the SAM exposed to extreme ultraviolet radiation (EUV) become resistant to ALD deposition. Subsequent treatment of the exposed SAM to an ALD process results in selective growth of an ALD film on the non-exposed regions of the SAM, leaving the exposed regions substantially free of ALD material.

EUV patterning of monolayers for selective atomic layer deposition

Self-assembled monolayers (SAMs) were selectively prepared on portions of a substrate surface utilizing compounds comprising a hydrogen-bonding group and polymerizable diacetylene group. The SAMs were photopolymerized using ultraviolet light. The pre-polymerized and polymerized SAMs were more effective barriers against metal deposition in an atomic layer deposition process compared to similar compounds lacking these functional groups.

Polymerizable self-assembled monolayers for use in atomic layer deposition

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Arlington, MA, United States of America

Noah F Fine Nathel