Asml Netherlands B.v.

Nirupam Banerjee

Marcus Adrianus Van De Kerkhof

Johannes Petrus Martinus Bernardus Vermeulen

Andrey Alexandrovich Nikipelov

Pieter-Jan Van Zwol

Paul Janssen

Mária Péter

David Ferdinand Vles

Arnoud Willem Notenboom

Egbert Lenderink

Derk Servatius Gertruda Brouns

Maxim Aleksandrovich Nasalevich

Willem Joan Van Der Zande

Matthias Kruizinga

Willem-Pieter Voorthuijzen

Aleksandar Nikolov Zdravkov

Gijsbert Rispens

Erik Achilles Abegg

Nadja Schuh

Michiel Alexander Blauw

Antonius Willem Verburg

Nicolae Maxim

Claudia Piliego

Johan Franciscus Maria Beckers

Erik Henricus Egidius Catharina Eummelen

Cornelius Maria Rops

Theodorus Wilhelmus Polet

Giovanni Luca Gattobigio

Ronald Frank Kox

Arend Johannes Donkerbroek

Daniel Grimm

Tim Rathje

Rik Vangheluwe

Sandro Wricke

Peter Brakhage

Martin Tilke

Mike Paulus Johannes Van Gils

Wouterus Jozephus Johannes Van Sluisveld

Mária PÉTER

Alexandar Nikolov Zdravkov

Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.

Membrane for EUV lithography

An image sensor for immersion lithography, the image sensor including: a grating; an absorber layer on the grating, the absorber layer configured to absorb radiation; and a liquidphobic coating at an upper surface of the image sensor, wherein a protective layer is provided between the absorber layer and the liquidphobic layer, the protective layer being less reactive than the absorber layer to an immersion liquid.

Image sensor for immersion lithography

A method of performance testing working parameters of a fluid handing structure in an immersion lithographic apparatus, the method including: placing a test substrate having an upper surface with a first portion with a resist defining the upper surface and a second portion with a material different from the resist defining the rest of the upper surface on a table in the immersion lithographic apparatus, confining liquid on a region of an upper surface of the table and/or the upper surface of the test substrate by operating the fluid handing structure using the associated working parameters, moving the table such that the region moves from the second portion to the first portion, and detecting change to and/or residue on the first portion as a result of liquid being left behind on the first portion during the moving.

Method of performance testing working parameters of a fluid handling structure and a method of detecting loss of immersion liquid from a fluid handing structure in an immersion lithographic apparatus

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Eindhoven, Netherlands

Nirupam Banerjee