Applied Materials, Inc.

Applied Materials Israel Limited

Niranjan Ramchandra Khasgiwale

Todd J Egan

Nag B Patibandla

Mehdi Vaez-Iravani

Guoheng Zhao

Mingwei Zhu

Yong Cao

Yoram Uziel

Weimin Zeng

Daniel Lee Diehl

Edward W Budiarto

Kyle Tantiwong

Zihao Yang

Igor Krivts (Krayvitz)

Israel Avneri

Ofer Adan

Venkatakaushik Voleti

Andreas Schulze

Renjing Zheng

Surender Kumar Gurusamy

Methods and systems for monitoring etch or deposition processes using image-based in-situ process monitoring techniques include illuminating a measurement area on a sample disposed in a process chamber. The measurement area is illuminated using an input beam generated remote from the process chamber and transmitted to a first viewing window of the process chamber by a first optical fiber. Portions of the first input beam reflected from the measurement area are transmitted from the first viewing window to an imaging sensor by a second optical fiber. A sequence of images is obtained at the imaging sensor, and a change in reflectance of pixels within each of the images is determined. The etch or deposition process is monitored based on the change in reflectance.

Image-based in-situ process monitoring

A method and apparatus for forming an optical stack having uniform and accurate layers is provided. A processing tool used to form the optical stack comprises, within an enclosed environment, a first transfer chamber, an on-board metrology unit, and a second transfer chamber. A first plurality of processing chambers is coupled to the first transfer chamber or the second transfer chamber. The on-board metrology unit is disposed between the first transfer chamber and the second transfer chamber. The on-board metrology unit is configured to measure one or more optical properties of the individual layers of the optical stack without exposing the layers to an ambient environment.

Optical stack deposition and on-board metrology

A method and a system for moving a substrate, the system includes a chamber, a chuck, a movement system that is positioned outside the chamber, a controller, an intermediate element, at least one sealing element that is configured to form a dynamic seal between the intermediate element and the chamber housing. The movement system is configured to repeat, for each region of the substrate out of a plurality of regions of the substrate, the steps of: rotating the chuck to position a given portion of the region of the substrate within a field of view that is related to an opening of the chamber housing; and moving the chuck relation to the opening to position additional portions of the region of the substrate within the field of view that is related to the opening.

Method and system for moving a substrate

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San Jose, CA, United States of America

Niranjan Ramchandra Khasgiwale