Asml Netherlands B.v.

Asme Netherlands B.v.

Nina Vladimirovna Dziomkina

Raymond Wilhelmus Louis Lafarre

Yogesh Pramod Karade

Nicolaas Ten Kate

Elisabeth Corinne Rodenburg

Sjoerd Nicolaas Lambertus Donders

Peter Van Delft

Sandra Van Der Graaf

Martinus Hendrikus Antonius Leenders

Marcus Adrianus Van De Kerkhof

Roelof Frederik De Graaf

Erik Henricus Egidius Catharina Eummelen

Paulus Martinus Maria Liebregts

Martijn Houben

Siegfried Alexander Tromp

Jacobus Josephus Leijssen

Takeshi Kaneko

Hendrik Huisman

Maurice Wilhelmus Leonardus Hendricus Feijts

Gerardus Martinus Antonius De Rooij

Vijay Kumar Badam

Johanna Antoinette Maria Sondag-Huethorst

Niek Elout De Kruijf

Michel Riepen

Cornelius Maria Rops

Henricus Wilhelmus Maria Van Buel

Rogier Hendrikus Magdalena Cortie

Jonghoon Baek

Lucas Henricus Johannes Stevens

Laurentius Johannes Adrianus Van Bokhoven

David Bessems

Chunguang Xia

Matthias Kruizinga

Andrew David LaForge

Fabrizio Evangelista

David Robert Evans

Henricus Jozef Castelijns

Yue Ma

John Tom Stewart, Iv

Johannes Adrianus Cornelis Maria Pijnenburg

Vitaliy Prosyentsov

Olga Vladimirovna Elisseeva

Laura Maria Fernandez Diaz

Deniz Van Heijnsbergen

Adrianus Marinus Verdonck

Jeroen Thomas Broekhuijse

Raymond Lafarre

Sjoerd Donders

Maurice Feijts

A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.

Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder

An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object are formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.

Substrate holder and method of manufacturing a substrate holder

A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.

A substrate holder for use in a lithographic apparatus, the substrate holder including: a main body; a plurality of first burls provided on a first side of the main body and having end surfaces to support a substrate, wherein the first burls each include CrN; and a plurality of second burls provided on a second side of the main body.

An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object is formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.

In some general aspects, a surface of a structure within a chamber of an extreme ultraviolet (EUV) light source is cleaned using a method. The method includes generating a plasma state of a material that is present at a location adjacent to a non-electrically conductive body that is within the chamber. The generation of the plasma state of the material includes electromagnetically inducing an electric current at the location adjacent the non-electrically conductive body to thereby transform the material that is adjacent the non-electrically conductive body from a first state into the plasma state. The plasma state of the material includes plasma particles, at least some of which are free radicals of the material. The method also includes enabling the plasma particles to pass over the structure surface to remove debris from the structure surface without removing the structure from the chamber of the EUV light source.

Cleaning a structure surface in an EUV chamber

A system including: a substrate support configured to hold a substrate; a conductive or semi-conductive element contacting the substrate support and covering at least part of the substrate support; and a charging device configured to apply a positive potential to the conductive or semi-conductive element with respect to the part of the substrate support that is covered by the conductive or semi-conductive element.

System, a lithographic apparatus, and a method for reducing oxidation or removing oxide on a substrate support

A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burs to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.

Growing community of inventors

Eindhoven, Netherlands

Nina Vladimirovna Dziomkina