Basf Se Corporation

Wayne State University

Other

Nilanka Weerathunga Sirikkathuge

Charles H Winter

Sabine Weiguny

Sinja Verena Klenk

David Dominique Schweinfurth

Lukas Mayr

Kyle Blakeney

Tharindu Malawara Arachchige Nimanthaka Karunaratne

Kerstin Schierle-Arndt

Hagen Wilmer

Daniel Waldmann

Daniel Löffler

Alexander Georg Hufnagel

Charles Hartger Winter

The present invention is in the field of processes for preparing inorganic metal- or semimetal-containing films. The process for preparing inorganic metal- or semimetal-containing films comprising (a) depositing a metal- or semimetal-containing compound from the gaseous state onto a solid substrate and (b) bringing the solid substrate with the deposited metal- or semimetal-containing compound in contact with a compound of general formula (I) or (II) wherein Z is NR, PR, OR, SR, CR, SiR, X is H, R' or NR′, wherein at least one X is H, n is 1 or 2, and R and R′ is an alkyl group, an alkenyl group, an aryl group, or a silyl group.

Process for the generation of metal- or semimetal-containing films

A process including bringing a solid substrate in contact with a compound of general formula (I), (II), (III), or (IV) in the gaseous state where A is NRor OR with R being an alkyl group, an alkenyl group, an aryl group, or a silyl group,E is NR or O,n is 0, 1 or 2, m is 0, 1 or 2, andR' is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group.

Process for the generation of metal-containing films

Described herein is a process for preparing inorganic metal-containing films including bringing a solid substrate in contact with a compound of general formula (I) or (II) in the gaseous state 

A process including bringing a solid substrate in contact with a compound of general formula (I), (II), (III), or (IV) in the gaseous state where A is NRor OR with R being an alkyl group, an alkenyl group, an aryl group, or a silyl group,E is NR or O,n isor, m isor, andR' is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group.

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Detroit, MI, United States of America

Nilanka Weerathunga Sirikkathuge