Ciba-geigy Corporation

Niklaus Buhler

Hans H Bosshard

Martin Roth

Martin Riediker

Daniel Bellus

Marcus Baumann

Joseph Berger

Kurt Meier

Alfred Sallmann

Elmar Sturm

Jean-Francois Reber

Knut A Jaeggi

Richard Goschke

Kurt Eichenberger

Ottmar Rohde

Milos Rusek

Jean F Reber

Titanocenes containing .pi.-cyclopentadienyl ligands, in which one or two carbocyclic or heterocyclic aromatic rings are attached to the metal atom, said aromatic rings being substituted by fluorine in at least one of the two ortho-positions relative to the metal-carbon bonds, are suitable photoinitiators for the photopolymerization of ethylenically unsaturated substrates. They are distinguished by high sensitivity, stability to air and heat, and are very effective in the range from UV light to visible light.

Process for producing photographic relief images using

Photopolymerizable composition containing metallocenes

Copper, lead, mercury, tin, gold, silver, palladium, osmium and/or cadmium can be deposited by photoredox reaction on semiconductor sulfide powders by irradiating a suspension of semiconductor sulfide powder in the presence of oxygen and optionally CO.sub.2, of an oxidizable system which optionally protects the semiconductor from photocorrosion, and of a salt or complex of copper, lead, mercury, tin, gold, silver, palladium, osmium and/or cadmium.

Process for the deposition of metals on semiconductor powders

Fluorinated titanocenes and photopolymerizable composition containing

Gold, silver or palladium can be deposited by photoredox reaction on semiconductor oxide powders by irradiating a suspension of semiconductor oxide powder in the presence of oxygen, CO.sub.2 or mixtures thereof, of an oxidizable system which protects the semiconductor from photocorrosion, and of a salt or complex of copper, lead, mercury, tin, gold, silver or palladium.

The invention relates to photopolymerizable compositions comprising (a) a prepolymer containing photopolymerizable olefinic double bonds, (b) photoinitiator of the formula ##STR1## wherein R.sup.1, R.sup.2 and R.sup.3 are as defined in claim 1, and optionally (c) an ester of acrylic or methacrylic acid or an allyl ether or allyl ester of a polyol. Owing to their excellent light sensitivity, these compositions are suitable for the economic production of high temperature resistant protective layers and relief structures having excellent resolution and good contours.

Photopolymerizable compositions containing prepolymers with olefin

A process is described for the selective production of hydrogen by means of heterogeneous photoredox catalysis, in which mixtures of water and alkali metal sulfites or sulfides, alkaline earth metal sulfites or sulfides or ammonium sulfites or sulfides are reacted under the action of light in a suspension of a cadmium sulfide, cadmium sulfoselenide or titanium dioxide/semiconductor powder which is at least partially coated with Cu, Cr, Ni, Co or a noble metal or mixtures thereof. The catalysts which can be employed in this process (coated semiconductor powders) are in some cases novel.

Process for the production of hydrogen by means of heterogeneous

Cyclobutanecarboxylic acid imides of the formula I ##STR1## wherein one of R.sub.1 and R.sub.6 is hydrogen, methyl or ethyl, and the other is methyl or ethyl, R.sub.2 and R.sub.3 independently of one another are each hydrogen, fluorine or methyl, or R.sub.2 is acetoxy or chlorine while R.sub.3 is hydrogen, and wherein R.sub.4 is hydrogen, methyl or chlorine, and R.sub.5 is hydrogen or methyl, whereby R.sub.3 and R.sub.4 together can also form an additional bond in the four-membered ring, are suitable for combating various fungi and have a particularly excellent action against Botrytis. They can be produced in an especially advantageous manner by photochemical [2+2] cycloaddition of alkenes or alkines with for example appropriately substituted maleic acid-(3,5-dichlorophenyl)-imides.

Cyclobutanedicarboxylic acid imides, and compositions for their use as

The invention relates to cyclobutanedicarboxisoimides of the formula I ##STR1## wherein one of X and Y is oxygen and the other is ##STR2## each of R.sub.1 and R.sub.6 independently is methyl or ethyl, each of R.sub.2 and R.sub.3 independently is hydrogen, fluorine or methyl, or R.sub.2 is aceto hydrogen or methyl, while R.sub.3 and R.sub.4 together can also form an additional valency in the 4-membered cycloaliphatic ring. These compounds are suitable for controlling a variety of phytopathogenic fungi. They can be obtained by cyclizing the corresponding cyclobutanedicarboxylic acid monoamides in the temperature range from about -20.degree. to +100.degree. C., in the presence of dehydrating agents such as acetic anhydride or N,N'-dicyclohexylcarbodiimide.

Cyclobutanedicarboxisoimides and use thereof as fungicides

Cyclobutanecarboxylic acid imides of the formula I ##STR1## wherein one of R.sub.1 and R.sub.6 is hydrogen, methyl or ethyl, and the other is methyl or ethyl, R.sub.2 and R.sub.3 independently of one another are each hydrogen, fluorine or methyl, or R.sub.2 is acetoxy or chlorine while R.sub.3 is hydrogen, and wherein R.sub.4 is hydrogen, methyl or chlorine, and R.sub.5 is hydrogen or methyl, whereby R.sub.3 and R.sub.4 together can also form an additional bond in the four-membered ring, are suitable for combating various fungi and have a particularly excellent action against Botrytis. They can be produced in an especially advantageous manner by photochemical [2+2] cycloaddition of alkenes or alkynes with for example appropriately substituted maleic acid-(3,5-dichlorophenyl)imides.

Use of 1,2-dimethyl-3-fluoro-, 1-methyl-3,3-difluoro-, and

The invention relates to asymmetrical thioindigo compounds of the formula I ##STR1## wherein at least one substituent R is different from a substituent R' and preferably at most three Rs or R's are different from hydrogen, e.g. the compound (I), wherein theRs and R's in the positions 4, 6, 7, 4', 6' and 7' are hydrogen, the R in position 5 is methyl and the R' in position 5' is --(CH.sub.2) OCOCH.sub.3. These compounds can be obtained by a novel process in simple and economic manner and in high purity by reacting a compound of the formula II ##STR2## (wherein X is halogen) with corresponding thiophenols, and cyclising the unsubstituted or substituted 2-thiophenyl-carboxymethylene-benzothiophen-3-ones thereby obtained. Some of the compounds of the formula I are known per se and they are used, inter alia, as disperse, melt spinning and pigment dyes.

Process for the production of asymmetrical thioindigo compounds

Novel halogenomethylene-indoxyls [halogeno-(3-oxa-[2H]- indol-2-ylidene)-acetic acids] and a novel process for their preparation by reacting N-acylanilides with dihalogenomaleic anhydrides or derivatives thereof are described. The novel halogenomethylene-indoxyls are valuable intermediates for the preparation of pharmaceutical active compounds having anti-allergic properties.

Halogenomethylene-indoxyls

Novel N-substituted halogenomethyleneindoxyls [N-substituted halogeno-(3-oxa[2H]indol-2-ylidene)-acetic acids] and a novel process for their preparation by reacting N-substituted anilides with dihalogenomaleic anhydrides or derivatives thereof are described. The novel N-substituted halogenomethyleneindoxyls are valuable intermediates for the preparation of pharmaceutical active compounds having an antiallergic action.

N-Substituted halogenomethyleneindoxyls

Novel benzoheterocyclylglyoxylic acid derivatives of the formula ##STR1## in which Z is free, etherified or acylated hydroxyl, X is thio or oxy, R is free or etherified hydroxyl, R.sub.1 is lower alkyl, cycloalkyl, hydroxyl, lower alkoxy, substituted or unsubstituted phenoxy, substituted or unsubstituted amino, acyl, carboxyl, halogen, nitro or, if Z is acylated hydroxyl and/or X is oxy, hydrogen, R.sub.2 is hydrogen, lower alkyl, hydroxyl or halogen and R.sub.3 and R.sub.4 are each hydrogen or lower alkyl, or in which two adjacent radicals R.sub.1, R.sub.2, R.sub.3 and R.sub.4 together form lower alkylene having 3 to 5 chain carbon atoms or 1,4-butadienylene and the other two radicals are each hydrogen, and their pharmaceutically acceptable salts are useful as anti-allergic agents.

Certain benzofuryl or benzothienyl-2-glyoxylic acid compounds

Novel halogeno-benzofuranone-carboxylic acids and a novel process for their preparation by reacting substituted or unsubstituted phenols with dihalogenomaleic anhydrides or derivatives thereof are described. The novel halogeno-benzofuranone-carboxylic acids are valuable intermediates for the preparation of pharmaceutical active compounds having an antiallergic action or for the preparation of biocidal active compounds for combating plant and animal pests, in particular phytopathogenic fungi and bacteria.

Growing community of inventors

Rheinfelden, Switzerland

Niklaus Buhler