Asml Netherlands B.v.

Asml Holding N.v.

Nikhil Mehta

Hugo Augustinus Joseph Cramer

Patrick Warnaar

Maurits Van Der Schaar

Patricius Aloysius Jacobus Tinnemans

Justin Lloyd Kreuzer

Armand Eugene Albert Koolen

Markus Gerardus Martinus Maria Van Kraaij

Vasco Tomas Tenner

Olger Victor Zwier

Jeroen Cottaar

Piotr Jan Meyer

Disclosed is a method for a metrology measurement on an area of a substrate comprising at least a portion of a target structure. The method comprises receiving a radiation information representing a portion of radiation scattered by the are, and using a filter in a Fourier domain for removing or suppressing at least a portion of the received radiation information that does not relate to radiation that has been scattered by the target structure for obtaining a filtered radiation information for the metrology measurement, wherein characteristics of the filter are based on target information about the target structure.

Method for filtering an image and associated metrology apparatus

A patterning device for patterning product structures onto a substrate and an associated substrate patterned using such a patterning device. The patterning device includes target patterning elements for patterning at least one target from which a parameter of interest can be inferred. The patterning device includes product patterning elements for patterning the product structures. The target patterning elements and product patterning elements are configured such that the at least one target has at least one boundary which is neither parallel nor perpendicular with respect to the product structures on the substrate.

Metrology targets

A lithographic apparatus includes an illumination system to produce a beam of radiation, a support to support a patterning device to impart a pattern on the beam, a projection system to project the patterned beam onto a substrate, and a metrology system that includes a radiation source to generate radiation, an optical element to direct the radiation toward a target, a detector to receive a first and second radiation scattered by the target and produce a first and second measurement respectively based on the received first and second radiation, and a controller. The controller determines a correction for the first measurement, an error between the correction for the first measurement and the first measurement, and a correction for the second measurement based on the correction for the first measurement, the second measurement, and the error. The lithographic apparatus uses the correction to adjust a position of a substrate.

Metrology system, lithographic apparatus, and calibration method

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Stamford, CT, United States of America

Nikhil Mehta