Asml Netherlands B.v.

Koninklijke Philips Corporation N.v.

Niels Machiel Driessen

Maarten Marinus Johannes Wilhelmus Van Herpen

Vadim Yevgenyevich Banine

Derk Jan Wilfred Klunder

Wouter Anthon Soer

Olav Waldemar Vladimir Frijns

Johannes Christiaan Leonardus Franken

Wilhelmus Josephus Box

Hendrikus Gijsbertus Schimmel

Derek Jan Wilfred Klunder

An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.

Radiation system and lithographic apparatus comprising the same

A device is arranged to measure a quantity relating to radiation. The device includes a sensor configured to measure the quantity, a screen arranged to protect the sensor from incoming particles emitted from a source configured to emit extreme ultraviolet radiation, and a mirror configured to redirect extreme ultraviolet radiation emitted by the source, past the screen, to the sensor.

Device arranged to measure a quantity relating to radiation and lithographic apparatus

The invention relates to a radiation system for generating a beam of radiation. The radiation system includes an extreme ultraviolet source constructed and arranged to generate extreme ultraviolet radiation, a contamination barrier constructed and arranged to trap contamination from the radiation source, and a temperature sensor constructed and arranged to sense a temperature of the contamination barrier.

Radiation system and lithographic apparatus

Growing community of inventors

Valkenswaard, Netherlands

Niels Machiel Driessen