Asml Netherlands B.v.

Niek Jacobus Johannes Roset

Nicolaas Ten Kate

Raymond Wilhelmus Louis Lafarre

Gijs Kramer

Marcus Martinus Petrus Adrianus Vermeulen

Simon Karel Ravensbergen

Sergei Shulepov

Thibault Simon Mathieu Laurent

Ronald Van Der Ham

Justin Johannes Hermanus Gerritzen

Tjarko Adriaan Rudolf Van Empel

Frank Pieter Albert Van Den Berkmortel

Michel Riepen

Cornelius Maria Rops

Rogier Hendrikus Magdalena Cortie

Ruud Hendrikus Martinus Johannes Bloks

Siegfried Alexander Tromp

Jim Vincent Overkamp

Coen Hubertus Matheus Baltis

Mark Constant Johannes Baggen

Henricus Jozef Castelijns

Marco Adrianus Peter Van Den Heuvel

Giovanna De Simone

Roger Anton Marie Timmermans

Herman Vogel

Martijn Houben

Yuri Johannes Gabriël Van De Vijver

Alexander Nikolov Zdravkov

Nicholas Peter Waterson

Vincentius Fransiscus Cloosterman

Engelbertus Antonius Fransiscus Van Der Pasch

Jozef Petrus Henricus Benschop

Bernardus Antonius Johannes Luttikhuis

Gerardus Adrianus Antonius Maria Kusters

Pieter Renaat Maria Hennus

Hrishikesh Patel

Nicolaas Petrus Marcus Brantjes

Sander Van Opstal

Michiel Theodorus Jacobus Fonteyn

A substrate support for supporting a substrate in a lithographic apparatus, the substrate support including: a support body configured to support the substrate; a main body separate from the support body and configured to support the support body, the main body including a thermal conditioner configured to thermally condition the main body and/or support body and/or substrate; and an extractor body surrounding the main body and the support body, the extractor body having an extraction channel configured to extract fluid from near a peripheral part of the substrate.

Substrate support and substrate table

A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.

Substrate holder for use in a lithographic apparatus

A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.

Method of unloading an object from a support table

An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.

Extraction body for lithographic apparatus

A lithographic apparatus including a fluid handling structure configured to contain immersion fluid in a space adjacent to an upper surface of the substrate table and/or a substrate located in a recess of the substrate table, a cover having a planar main body that, in use, extends around a substrate from the upper surface to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate, and an immersion fluid film disruptor, configured to disrupt the formation of a film of immersion fluid between an edge of the cover and immersion fluid contained by the fluid handling structure during movement of the substrate table relative to the fluid handling structure.

Lithographic apparatus, fluid handling structure for use in a lithographic apparatus and device manufacturing method

A lithographic apparatus having a fluid handling structure configured to contain immersion fluid in a space adjacent to an upper surface of a substrate table and/or a substrate located in a recess of the substrate table, a cover including a planar main body that, in use, extends around a substrate from the upper surface to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate, and an immersion fluid film disruptor configured to disrupt the formation of a film of immersion fluid between an edge of the cover and immersion fluid contained by the fluid handling structure during movement of the substrate table relative to the fluid handling structure.

Lithographic apparatus, cover for use in a lithographic apparatus and method for designing a cover for use in a lithographic apparatus

A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body includes a projection configured such that it surrounds the object holder and such that, in use, a layer of immersion liquid is retained on the projection and in contact with an object supported on the object holder.

Support apparatus, lithographic apparatus and device manufacturing method

A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size.

Fluid handling structure, a lithographic apparatus and a device manufacturing method

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Eindhoven, Netherlands

Niek Jacobus Johannes Roset