Asml Netherlands B.v.

Niek Elout De Kruijf

Martinus Hendrikus Antonius Leenders

Martijn Houben

Marcus Adrianus Van De Kerkhof

Roelof Frederik De Graaf

Nina Vladimirovna Dziomkina

Paulus Martinus Maria Liebregts

Vijay Kumar Badam

Johanna Antoinette Maria Sondag-Huethorst

Gerardus Martinus Antonius De Rooij

Mircea Dusa

Thomas Poiesz

Abraham Alexander Soethoudt

Antonie Hendrik Verweij

Justin Johannes Hermanus Gerritzen

Marco Adrianus Peter Van Den Heuvel

Paul Van Dongen

Johannes Gerardus Maria Mulder

A substrate support, includes: a substrate support location configured to support a substrate, and a vacuum clamping device configured to clamp the substrate on the substrate support location, wherein the vacuum clamping device includes at least one reduced pressure source to create a reduced pressure, at least one vacuum section connected to the at least one reduced pressure source, wherein the at least one vacuum section is configured to attract the substrate towards the substrate support location, and a control device configured to control a spatial pressure profile along the at least one vacuum section with which the substrate is attracted by the vacuum clamping device, wherein the control device includes a substrate shape data input to receive substrate shape data representing shape data of the substrate to be clamped, and wherein the control device is configured to adapt the spatial pressure profile in dependency of the substrate shape data.

Substrate support, method for loading a substrate on a substrate support location, lithographic apparatus and device manufacturing method

A member is provided to prevent immersion liquid ingress to a gap between components or to adhere to at least one component to provide a surface to a feature of an immersion system. The member has a plastic sealing portion that is adhered to the component(s). The plastic sealing portion is opaque to DUV radiation. It may be resistant to degradation through exposure to DUV radiation. It may have a liquid phobic coating or property.

Lithographic apparatus, removable member and device manufacturing method

A sealing member is provided to prevent immersion liquid ingress to a gap between components. The sealing member has a plastic or polymer sealing portion that is adhered to the components forming the gap being sealed. The sealing member is constructed so as to reduce the force-coupling, in particular the time-related force-coupling, between the components being sealed.

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Eindhoven, Netherlands

Niek Elout De Kruijf