Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V.

Nicolas Schiller

Steffen Straach

Matthias Fahland

Manfred Neumann

Klaus Goedicke

Siegfried Schiller

Volker Kirchhoff

Christoph Charton

Mario Krug

Christoph Metzner

Henry Morgner

Wolfgang Schwarz

Frank-Holm Rögner

Wolfgang Hempel

John Fahlteich

Waldemar Schoenberger

Steffen Günther

Tobias Vogt

Mathias Räbisch

Björn Meyer

Gerhard Zeissig

Steffen Guenther

Katrin Wald

Hendrik Drese

Sebastian Bunk

Mathias Raebisch

Thomas KÜHNEL

Waldemar SCHÖNBERGER

Alexander SCHÖNBERGER

A transparent plastic film for screening electromagnetic waves includes a transparent film substrate and a layer system comprising at least one silver layer and two niobium oxide layers. The silver layer is embedded between the two niobium oxide layers.

Transparent plastic film for shielding electromagnetic waves and method for producing a plastic film of this type

The invention relates to a method for producing an ultrabarrier layer system through vacuum coating a substrate with a layer stack that is embodied as an alternating layer system of smoothing layers and transparent ceramic layers, but comprising at least one smoothing layer between two transparent ceramic layers, which are applied by sputtering, in which during the deposition of the smoothing layer a monomer is admitted into an evacuated coating chamber in which a magnetron plasma is operated.

Method for the production of an ultra barrier layer system

The invention relates to a device for the plasma activated vapor coating of large-surface moved substrates, comprising at least one vacuum recipient, one pump system, one evaporator, one device for holding and transporting the substrates to be coated and at least one arc discharge plasma source, whereby at least one device for generating a magnetic field is included, which device can generate a magnetic field between the evaporator and the substrate, the field lines of which magnetic field are aligned approximately perpendicular to the movement direction and parallel to the transport plane of the substrate, and at least one arc discharge plasma source is arranged such that the axis of the arc discharge plasma source is aligned approximately perpendicular to the field lines of the magnetic field.

Device for plasma-activated vapor coating of large surfaces

The invention relates to a method for vapor-depositing strip-shaped substrates with a transparent barrier layer made of aluminum oxide by reactively vaporizing aluminum and admitting reactive gas in a strip vapor-deposition installation. The invention provides that, before coating with aluminum oxide, a partially enclosed layer made of a metal or of a metal oxide is applied to the substrate by magnetron sputtering.

Method of vapor-depositing strip-shaped substrates with a transparent barrier layer made of aluminum oxide

Process for producing organically modified oxide, oxynitride or nitride

A method for the electron beam deposition of a multicomponent evaporant to ensure a consistent layer quality with constant composition and thickness in a defined manner. The X-radiation emitted from the evaporant on the point of electron beam impingement is measured in situ, using the obtained signal as reference input to control the parameters of the evaporation process and therefore to control the deposition rate and material composition of the deposited layer. The method is used for the production of corrosion resistant, high-temperature resistant, hard-wearing or optical layers on, for example, strip steel or plastic film.

Method for electron beam deposition of multicomponent evaporants

Method for plasma-assisted reactive electron beam vaporization

Growing community of inventors

Stolpen OT Helmsdorf, Germany

Nicolas Schiller