Saint-Gobain Glass France

Saint-Gobain Corporation

Sanit-Gobain Glass France

Nicolas Nadaud

Jean-Christophe Giron

Stéphanie Morlens

Xavier Talpaert

Emmanuel Mimoun

Klaus Fischer

Veronique Rondeau

Vincent Reymond

Heinz Schicht

Uwe Schmidt

Andriy Kharchenko

Vincent Rachet

Sylvain Belliot

Anne Durandeau

Carinne Fleury

Lorenzo Canova

Brice Dubost

Jean-Pierre Brochot

Eric E Mattmann

Arnaud Huignard

Rene Gy

Bernard Nghiem

René Gy

Pascal Reutler

François Guillemot

Driss Lamine

Nisita Wanakule

Ulrich Billert

Estelle Martin

Vincent Chery

Véronique Rondeau

Laurent LaBrousse

Laurent Labrousse

Eric Mattman

Marcus Loergen

Dominique Billieres

Jean-Paul Rousseau

Alfred Hofrichter

Manfred Jansen

Carole Baubet

Charles Anderson

Frédéric Barrieres

Se-Jong Kim

Emmanuelle Peter

Barbara Brudieu

Valérie Coustet

Jean Paul Rousseau

Binh Tran

Eric Petit Jean

Guillaume Bignon

Christian Bernhard Petersen

Sébastien Roy

Jean Christophe Giron

Dominique 1 Lotissement Du Moulin Billieres

Laeticia Gueneau

Thibaut Heitz

Li-Ming Yu

Jürgen SCHÜTT

Stéphanie Roche

Stephanie Morlens

Martin Melcher

An article includes a substrate including two main faces defining two main surfaces separated by edges, the substrate bearing a functional coating deposited by magnetron sputtering deposited on at least one portion of one main surface, and a temporary protective layer deposited on at least one portion of the functional coating, wherein, the temporary protective layer is deposited directly in contact with the functional coating, the temporary protective layer has a thickness of at least 1 micrometer, the temporary protective layer is not soluble in water, and the temporary protective layer is obtained from a composition comprising (meth)acrylate compounds, the substrate bearing the functional coating has not undergone a heat treatment at a temperature above 400&#xb0; C.

Substrate having a functional coating and a temporary protection layer

The invention relates to a process for obtaining a material comprising a substrate coated on at least one part of at least one of its faces with at least one functional layer, said process comprising:

Method for obtaining a substrate coated with a functional layer by using a sacrificial layer

The invention relates to a substrate comprising two main faces defining two main surfaces separated by edges, said substrate bearing a functional coating deposited on at least one portion of one main surface and a temporary protective layer deposited on at least one portion of the functional coating. The temporary protective layer, cured by drying, by UV irradiation or by an electron beam, has a thickness of at least 1 micrometer and is not soluble in water. This temporary protective layer is obtained from a liquid composition comprising (meth)acrylate compounds selected from monomers, oligomers, prepolymers or polymers comprising at least one (meth)acrylate function.

A process for obtaining an item including a substrate made of glass or glass ceramic coated on at least one portion of at least one of its faces with a stack of thin-layers including no silver layers and including at least one thin layer of a transparent electrically conductive oxide, the process including: a step of depositing the stack, in which step the thin layer of a transparent electrically conductive oxide and at least one thin homogenizing layer are deposited, the thin homogenizing layer being a metal layer or a layer based on a metal nitride other than aluminum nitride, or a layer based on metal carbide; then a heat treatment step in which the stack is exposed to radiation.

Method for producing a substrate coated with a stack including a conductive transparent oxide film

A process for obtaining a substrate provided with a coating, in which the coating includes a pattern with spatial modulation of at least one property of the coating, includes performing a heat treatment, using a laser radiation, of a continuous coating deposited on the substrate. The heat treatment is such that the substrate is irradiated with the laser radiation focused on the coating in the form of at least one laser line, keeping the coating continuous and without melting of the coating, and a relative displacement of the substrate and of the laser line focused on the coating is imposed in a direction transverse to the longitudinal direction of the laser line, while temporally modulating during this relative displacement the power of the laser line as a function of the speed of relative displacement and of the dimensions of the pattern in the direction of relative displacement.

Process for obtaining a substrate provided with a coating

A substrate includes two main faces defining two main surfaces separated by edges, the substrate bearing a functional coating deposited on at least one portion of one main surface and a temporary protective layer deposited on at least one portion of the functional coating. The temporary protective layer, cured by drying, by UV irradiation or by an electron beam, has a thickness of at least 1 micrometer and is not soluble in water. This temporary protective layer is obtained from a liquid composition including (meth)acrylate compounds selected from monomers, oligomers, prepolymers or polymers including at least one (meth)acrylate function.

A process for producing a substrate coated on a face with a low-E thin film multilayer, the process including: depositing a thin-film multilayer containing a thin silver film between at least two thin dielectric films and an absorbent film on a face a substrate; and heat treating the coated face with laser radiation between 500 and 2000 nm to reduce at least one selected from the group of the emissivity and the sheet resistance of the multilayer by at least 5%, wherein the absorbent film at least partially absorbs the laser radiation so that the absorption of the multilayer the wavelength of the laser radiation is such that the absorption of a clear glass substrate 4 mm in thickness coated with the multilayer at the wavelength of the laser radiation is greater than or equal to 10%.

Thin film deposition method and resulting product

A method of obtaining a substrate coated on a first face with at least one transparent and electrically conductive thin layer based on at least one oxide, including depositing the at least one thin layer on the substrate and subjecting the at least one thin layer to a heat treatment in which the at least one layer is irradiated with aid of radiation having a wavelength between 500 and 2000 nm and focused on a zone of the at least one layer, at least one dimension of which does not exceed 10 cm. The radiation is delivered by at least one radiation device facing the at least one layer, a relative displacement being created between the radiation device and the substrate to treat the desired surface, the heat treatment being such that resistivity of the at least one layer is reduced during the treatment.

Method for depositing a thin film, and resulting material

One subject of the invention is a process for the treatment of at least one thin continuous film deposited on a first side of a substrate, characterized in that said at least one thin film is raised to a temperature of at least 300&#xb0; C. while maintaining a temperature not exceeding 150&#xb0; C. on the opposite side of said substrate to said first side, so as to increase the degree of crystallization of said thin film while keeping it continuous and without a step of melting said thin film. Another subject of the invention is the material that can be obtained by this process.

Method for depositing a thin layer and product thus obtained

The subject of the invention is a process for obtaining a substrate coated on at least part of its surface with at least one film of oxide of a metal M the physical thickness of which is 30 nm or less, said oxide film not being part of a multilayer comprising at least one silver film, said process comprising the following steps:

Thin film deposition method

The subject of the invention is a heat treatment process by flame treatment of at least one thin film deposited on a glass substrate () running in the path of at least one flame treatment device comprising at least one burner (), said treatment being able to increase the degree of crystallization of said at least one thin film and/or to increase the size of the crystallites in said at least one thin film, said process being characterized in that the maximum transient bending 'b' is less than 150 mm and respects the following condition:&#x2266;0.9&#xd7;

The subject of the invention is a process for obtaining a material comprising a substrate and at least one at least partially crystalline titanium-oxide-based thin film deposited on a first side of said substrate, said process comprising the following steps:

Method for thin layer deposition

A glazing for thermal control and heating is provided. The glazing includes a transparent substrate including glass and provided with a thin-film stack including a plurality of functional layers. The thin-film stack includes at least three silver-based functional layers. The thin-film stack has a resistance R&#x3c;1.5&#x3a9; per square.

Transparent substrate which can be used alternatively or cumulatively, for thermal control, for electromagnetic armour and for heated glazing

The invention relates to a substrate (), provided with a thin-film multilayer comprising an alternation of n functional layers () having reflection properties in the infrared and/or in solar radiation and (n+1) coatings (), where n is an integer &#x2267;2, said coatings being composed of a plurality of dielectric layers (), so that each functional layer () is placed between two coatings (), at least two functional layers () each being deposited on a wetting layer () itself deposited respectively directly onto a subjacent coating (), characterized in that two subjacent coatings () each comprise at least one dielectric layer () and at least one noncrystalline smoothing layer () made from a material that is different from the material of said dielectric layer within each coating, said smoothing layer () being in contact with said superjacent wetting layer () and in that these two subjacent coatings () being of different thicknesses, the thickness of the smoothing layer () of the subjacent coating () that has a total thickness of less than that of the other subjacent coating () is less than or equal to the thickness of the smoothing layer () of this other subjacent coating ().

Substrate comprising a stack having thermal properties

A method for the continuous vacuum cleaning of a substrate, characterized in that:

Method for cleaning a substrate

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Paris, France

Nicolas Nadaud