Université Joseph Fourier

Institut Polytechnique De Grenoble

Centre National De La Recherche Scientifique

Université Grenoble Alpes

Nicolas Gondrexon

Francis Baillet

Frédéric Pignon

Yao Jin

Stéphane Baup

Nicolas Hengl

The invention relates to a method for etching a structure () including at least one material () to be etched, said method consisting in: selecting at least one chemical species that can react with the material () to be etched; selecting at least one soluble compound that can release this chemical species; producing a solution () containing said compound; placing the structure () in a position such that the surface of the material to be etched is in the presence of the solution and additional bubbles of a gas; and producing high-frequency ultrasounds in the solution, at at least one frequency, capable of generating reactive cavitation bubbles such that the chemical species is generated in the presence of these additional bubbles and reacts with the material to be etched, thereby producing a soluble compound or a precipitate.

Method for etching a material in the presence of a gas

The invention relates to a method for etching a structure () including at least one material () to be etched, said method consisting in: selecting at least one chemical species that can react with the material () to be etched; selecting at least one soluble compound that can release this chemical species; producing a solution () containing the compound and a powder of particles or solid grains () in suspension; placing the material to be etched in the presence of the solution; and producing high-frequency ultrasounds in the solution, at at least one frequency, capable of generating active cavitation bubbles such that the chemical species is generated and reacts with the material to be etched, thereby producing a soluble compound or a precipitate.

Method for etching a material in the presence of solid particles

Method and device for selectively etching a first material () relative to a second material (), comprising a bath () of a solution capable of producing at least one chemical species for etching the first material () but not the second () and a system () for generating ultrasound at a frequency between 100 kHz and 3 MHz in the bath in order to produce cavitation bubbles.

Method for selective etching

Growing community of inventors

Meylan, France

Nicolas Gondrexon