Luxembourg Institute of Science and Technology

Ucl Business Plc

Centre De Recherche Public-gabriel Lippmann

Eurofoil Luxembourg S.a.

Nicolas Boscher

Patrick Choquet

Mathieu Gerard

David Duday

Christophe Detrembleur

Stephane Verdier

Kamal Baba

Giuseppe Bengasi

Simon Bulou

Florian Hilt

Maryline Moreno-Couranjou

Rodolphe Mauchauffe

Christelle Vreuls

Cecile Vandeweerdt

Jean-Baptiste Chemin

Miguel Quesada Gonzalez

Cécile Vandeweerdt

Caroline Knapp

Stéphane Verdier

A conductive coating comprising polymers of meso-meso, β-β doubly linked fused and/or meso-β, β-meso doubly linked fused and/or meso-meso, β-β, β-βtriply linked fused (poly)porphyrins. A method for forming on a substrate a thin conductive coating of polymers of meso-meso, β-β doubly and/or meso-β, β-meso doubly and/or meso- meso, β-β, β-β triply linked fused (poly)porphyrins, the method comprising the steps of providing a substrate in a vacuum chamber, performing on the substrate an oxidative chemical vapour deposition reaction with an oxidant and at least one porphyrin monomer.

Conductive film of fused porphyrins polymer and method of forming a coated substrate

A solvent-free plasma method for depositing an adherent catechol and/or quinone functionalised layer to an inorganic or organic substrate from a precursor which comprises at least a quinone group; a protected or unprotected catechol group; a molecule substituted by a quinone group and/or a protected or unprotected catechol group; and/or a natural or synthetic derivative of a catechol group and/or a quinone group; wherein the quinone group is a 1,2-benzoquinone group and the catechol group is a 1,-dihydroxybenzene group.

Plasma deposition method for catechol/quinone functionalised layers

The invention provides a method for forming regular polymer thin films on a substrate using atmospheric plasma discharges. In particular, the method allows for the deposition of functional polymer thin films which require a high regularity and a linear polymer structure.

Method for forming regular polymer thin films using atmospheric plasma deposition

The invention is directed to a method for manufacturing a hydrophobic or superhydrophobic surface comprising the steps of: (a) providing a substrate with a surface roughness Rbetween 0.1 and 1.0 &#x3bc;m and (b) exposing the substrate to a filamentary atmospheric pressure dielectric barrier discharge plasma which is fed by a reaction gas and siloxane-forming material in order to form a superhydrophobic siloxane layer over at least a portion of the surface of the substrate. Step (b) is operated with an electrical excitation frequency of 15,000 Hz to 35,000 Hz and a power density between 0.5 to 10 W&#xb7;cm. The siloxane layer produced in step (b) shows thereby a micro-structure and a nano-structure with droplet 'sticking' properties (high water sliding angle).

Method for manufacturing a superhydrophobic surface, surface so obtained and use of it

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Audun-le-Tiche, France

Nicolas Boscher