Asml Netherlands B.v.

Asml Holding N.v.

U.S. Philips Corporation

Asml Holdings N.v.

Nicolaas Rudolf Kemper

Nicolaas Ten Kate

Sjoerd Nicolaas Lambertus Donders

Joost Jeroen Ottens

Christiaan Alexander Hoogendam

Martinus Hendrikus Antonius Leenders

Michel Riepen

Marcel Beckers

Henrikus Herman Marie Cox

Frits Van Der Meulen

Johannes Petrus Maria Smeulers

Stefan Philip Christiaan Belfroid

Martinus Cornelis Maria Verhagen

Jeroen Johannes Sophia Maria Mertens

Johannes Henricus Wilhelmus Jacobs

Sergei Shulepov

Jan-Gerard Cornelis Van Der Toorn

Franciscus Johannes Herman Maria Teunissen

Herman Vogel

Roelof Frederik De Graaf

Ferdy Migchelbrink

Marco Polizzi

Elmar Evers

Erik Roelof Loopstra

Edwin Augustinus Matheus Van Gompel

Marco Koert Stavenga

Cornelius Maria Rops

Koen Steffens

Herman Boom

Edwin Cornelis Kadijk

Bob Streefkerk

Erik Henricus Egidius Catharina Eummelen

Richard Moerman

Danny Maria Hubertus Philips

Fabrizio Evangelista

Johannes Catharinus Hubertus Mulkens

Harmen Klaas Van Der Schoot

Hernes Jacobs

Marinus Jochemsen

Marcus Martinus Petrus Adrianus Vermeulen

Daniel Jozef Maria Direcks

Carlo Cornelis Maria Luijten

Anthonie Kuijper

Robertus Mathijs Gerardus Rijs

Hans Butler

Engelbertus Antonius Fransiscus Van Der Pasch

Johannes Petrus Martinus Bernardus Vermeulen

Franciscus Johannes Joseph Janssen

Marc Wilhelmus Maria Van Der Wijst

Paulus Martinus Maria Liebregts

Ronald Van Der Ham

Arno Willem Frederik Volker

Robert-Han Munnig Schmidt

Cédric Désiré Grouwstra

Marinus P Koster

Youssef Karel Maria De Vos

Peter Paul Hempenius

Jimmy Matheus Wilhelmus Van De Winkel

Norbertus Josephus Martinus Van Den Nieuwelaar

Paul Petrus Joannes Berkvens

Sebastiaan Maria Johannes Cornelissen

Clemens Johannes Gerardus Van Den Dungen

Paul Corné Henri De Wit

Gert-Jan Gerardus Johannes Thomas Brands

Robertus Nicodemus Jacobus Van Ballegoij

Christophe De Metsenaere

Stijn Willem Boere

Hans Jansen

Andre Bernardus Jeunink

Theodorus Petrus Maria Cadee

Jan Van Eijk

Tjarko Adriaan Rudolf Van Empel

Martijn Houben

Frank Johannes Jacobus Van Boxtel

Rogier Hendrikus Magdalena Cortie

Dominicus Jacobus Petrus Adrianus Franken

Jozef Petrus Henricus Benschop

Edwin Johan Buis

Wilhelmus Franciscus Johannes Simons

Noud Jan Gilissen

David Bessems

Han Henricus Aldegonda Lempens

Petrus Matthijs Henricus Vosters

Marcel Koenraad Marie Baggen

Günes Nakiboglu

Pieter Mulder

Mark Constant Johannes Baggen

Peter Paul Steijaert

Martinus Van Duijnhoven

Fransiscus Mathijs Jacobs

Jan Cornelis Van Der Hoeven

Ronald Johannes Hultermans

Christiaan Louis Valentin

Sander Kerssemakers

Johannes Andreas Henricus Maria Jacobs

Willem Van Der Hoek

Lambertus Adrianus Van Den Wildenberg

Hendrikus Herman Marie Cox

Jan Willem Cromwijk

Pieter Lein Joseph Gunter

Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.

Lithographic apparatus and device manufacturing method

A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.

Lithographic apparatus and a method of operating the apparatus

An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.

A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge.

Fluid handling structure, lithographic apparatus and device manufacturing method

A plurality of extraction conduits is provided to remove immersion liquid into a chamber. The extraction conduits are arranged at different distances from a target portion of the substrate. From the chamber, a passage is provided to which a suction force is applied. When all the conduits are filled with immersion liquid, the extraction capacity will be greater than when one or more of the conduits comprise gas.

Lithographic apparatus and device manufacturing method involving a barrier structure to handle liquid

A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

A barrier member configured to at least partly confine a liquid in a space between a projection system and a substrate table of an immersion lithographic system, the barrier member including: a liquid inlet configured to provide liquid to the space, a liquid outlet configured to remove liquid from the space, the liquid outlet having a porous member located in a surface configured toward face the substrate, a first gas inlet configured to provide gas to the space, the first gas inlet arranged to face toward the substrate and the first gas inlet located outward, relative to a central portion of the barrier member, of the porous member, and a second gas inlet configured to provide gas to the space, the second gas inlet arranged to face toward the substrate and the second gas inlet located outward, relative to the central portion, of the first gas inlet.

A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.

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Eindhoven, Netherlands

Nicolaas Rudolf Kemper