Asml Netherlands B.v.

Nico Vanroose

Johannes Jacobus Matheus Baselmans

James Robert Downes

Nick Kant

Roland Johannes Wilhelmus Stas

Giovanni Imponente

Lense Hendrik-Jan Maria Swaenen

Pieter Bart Aloïs De Buck

Chanpreet Kaur

Robertus Martinus Alphonsus Van Herpen

Mark Louwrens Beks

A method of reducing an aberration arising during operation of a lithographic apparatus, the method comprising measuring the aberration to obtain an aberration signal, the aberration signal comprising a first component and a second component, wherein the first component of the aberration signal comprises a first frequency band and the second component of the aberration signal comprises a second frequency band, wherein the first frequency band comprises frequencies that are higher than frequencies comprised in the second frequency band, calculating a correction, wherein a first part of the correction is calculated based on the first component of the aberration signal, and applying the correction to the lithographic apparatus.

Lithographic method and apparatus

A method comprising illuminating a patterning device (MA') comprising a plurality of patterned regions (-) of which each patterns a measurement beam (-), projecting, with a projection system (PL), the measurement beams onto a sensor apparatus () comprising a plurality of detector regions (-), making a first measurement of radiation when the patterning device and the sensor apparatus are positioned in a first relative configuration, moving at least one of the patterning device and the sensor apparatus so as to change the relative configuration of the patterning device to a second relative configuration, making a second measurement of radiation when the patterning device and the sensor apparatus are positioned in the second relative configuration in which at least some of the plurality of detector regions receive a different measurement beam to the measurement beam which was received at the respective detector region in the first relative configuration and determining aberrations caused by the projection system.

A method of reducing an aberration of a lithographic apparatus, the method including measuring the aberration, taking the measured aberration into account, estimating a state of the lithographic apparatus, calculating a correction using the estimated state, and applying the correction to the lithographic apparatus.

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Borgerhout, Belgium

Nico Vanroose