Corning Incorporated

Nick J Visovsky

Nicholas Francis Borrelli

David G Grossman

Kenjro Hasui

David D Wang

Tamio Kosaka

A method for fabricating an integrated optical isolator includes depositing a wire grid material on a magneto-optical substrate and depositing a resist film on the wire grid material. The method further includes bringing a mold with a wire grid pattern on contact with the resist film and compressing the mold and resist film together so as to emboss the wire grid pattern in the resist film. The method further includes transferring the wire grid pattern in the resist film to the wire grid material on the magneto-optical substrate by etching.

Method for fabricating an integrated optical isolator and a novel wire grid structure

A method of replicating a nanoscale pattern which comprises forming the pattern on the outer surface of a cylindrical roller, providing a surface upon which the pattern is to be replicated, and transferring the nanoscale pattern from the cylindrical roller onto the surface to provide at least one replication of the pattern on that surface. The roller is adapted to carry the pattern on its outer surface and transfer the pattern to a substrate. The ultimate product may be a grating polarizer.

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Corning, NY, United States of America

Nick J Visovsky