Other

Nick Cobb

George P Lippincott

Robert A Todd

One or more control points are identified within a reticle layout that is used in a simulation of a manufacturing process for an integrated device layer. Further, a current geometrical layout pattern is determined in the vicinity of the control points, and a cache is searched for a matching geometrical layout pattern. If the search is successful, a simulation result associated with the matching geometrical layout pattern is retrieved from the cache and reused for the current geometrical layout pattern. Alternatively, if the search is unsuccessful, a simulation result associated with the current geometrical design pattern is computed and stored in the cache for future reuse.

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San Jose, CA, United States of America

Nick Cobb