Ecolab USA Inc.

Applied Materials, Inc.

Nicholas Ryan Denny

Kun Xiong

Bruce A Keiser

Wayne M Carlson

Shawn Dalke

David M Dotzauer

Felice DiMascio

Mei Yin Chang

Chien-Teh Kao

David R Papanek

Emily Rader

Peter E Reed

Joseph F AuBuchon

Xiaoxiong Yuan

Joel M Huston

David T Or

Stephen Joseph Hinterlong

Hyman W H Lam

Jianwei Yuan

Daniel Eugene Schwarz

Donald O'Brien

John V Meier

Hyman Lam

Tommy Hung-Ting Chen

Gary Tabor

James L Jefferson

Felice Dimascio

A method of producing chlorine dioxide is disclosed. The method may include feeding a reaction mixture into a separator. The reaction mixture may follow a helical path through the separator and produce gaseous chlorine dioxide within the separator. Gaseous chlorine dioxide may be withdrawn from the separator and used to disinfect process water.

Pure chlorine dioxide generation system with reduced acid usage

A method of controlling a chemical reaction is disclosed. The method may include feeding a solution at a first flow rate into a reactor and detecting a sound in the reactor using a sound sensor that is adjacent to the reactor. The sound sensor may convert the sound into a sound signal. After the sound signal is acquired, it is compared to a stored sound signal or a stored sound threshold to detect a reaction event. The method may include adjusting the flow rate of solutions into the reactor in response to the reaction event.

Decomposition mediation in chlorine dioxide generation systems through sound detection and control

A method for the reduction and prevention of mercury emissions into the environment from combusted fossil fuels or other off-gases with the use of peracetic acid is disclosed. The peracetic acid is used for the capture of mercury from the resulting flue gases using a flue gas desulfurization system or scrubber. The method uses peracetic acid in conjunction with a scrubber to capture mercury and lower its emission and/or re-emission with stack gases. The method allows the use of coal as a cleaner and environmentally friendlier fuel source as well as capturing mercury from other processing systems.

Complexation and removal of mercury from flue gas desulfurization systems

The present disclosure generally relates to methods of treating process water using a reactor for generating chlorine dioxide onsite. The onsite generation system may include double ensured precursor feeding, effective reactor, automated control/alarm, and effective product delivery. The reactor may include a mixing device, a first feed line connected to the mixing device, and a second feed line connected to the mixing device. The reactor may include a proximal portion in fluid communication with the mixing device and a distal portion in fluid communication with a motive water line. The mixing device, the reactor, a portion of the first feed line, and a portion of the second feed line may be positioned within the motive water line.

Low risk chlorine dioxide onsite generation system

The present disclosure generally relates to producing chloride dioxide. A chlorine dioxide reactor, methods for producing chlorine dioxide, and treating aqueous systems are disclosed. The reactor may include a mixing device, a first feed line in fluid communication with the mixing device, and a second feed line in fluid communication with the mixing device. The reactor may include a proximal portion in fluid communication with the mixing device and a distal portion in fluid communication with a motive water line. The mixing device, the reactor, a portion of the first feed line, and a portion of the second feed line may be positioned within the motive water line.

The disclosure relates generally to reducing mercury emissions from a coal power plant. Specifically, a method for treating a gas stream containing mercury is provided that includes injecting a mercury oxidant or absorbent and a carrying agent into a gas stream that was produced by heating or burning a carbonaceous fuel comprising mercury. The carrying agent vaporizes after being injected into the gas stream. The mercury oxidant or absorbent and a carrying agent may be injected before passing the gas stream into a gas scrubber.

Enhanced injection of mercury oxidants

Additives including sulfur-containing compounds are used in methods of treating synthetic gypsum. The additives can thermally stabilize heavy metals, such as mercury. This thermal stabilization reduces mercury release from the synthetic gypsum. Illustrative, non-limiting examples of sulfur-containing compounds include inorganic sulfides, organic sulfides, organic compounds containing nitrogen and sulfur, organic compounds containing oxygen and sulfur, and polymers containing sulfur.

Gypsum additive to control mercury

A method for the reduction and prevention of mercury emissions into the environment from combusted fossil fuels or off-gases having mercury with the use of hypoiodite is disclosed. The hypoiodite is used for the capture of mercury from the resulting flue gases using a flue gas desulfurization system or scrubber. The method uses hypoiodite in conjunction with a scrubber to capture mercury and lower its emission and/or re-emission with stack gases. The method allows the use of coal as a cleaner and environmentally friendlier fuel source as well as capturing mercury from other processing systems.

A method for the reduction and prevention of mercury emissions into the environment from combusted fossil fuels or other off-gases with the use of hypobromite is disclosed. The hypobromite is used for the capture of mercury from the resulting flue gases using a flue gas desulfurization system or scrubber. The method uses hypobromite in conjunction with a scrubber to capture mercury and lower its emission and/or re-emission with stack gases. The method allows the use of coal as a cleaner and environmentally friendlier fuel source as well as capturing mercury from other processing systems.

Methods and apparatus for in-situ cleaning of substrate processing chambers are provided herein. A substrate processing chamber may include a chamber body enclosing an inner volume; a chamber lid removably coupled to the chamber body and including a first flow channel fluidly coupled to the inner volume to selectively open or seal the inner volume to or from a first outlet; a chamber floor including a second flow channel fluidly coupled to the inner volume to selectively open or seal the inner volume to or from a first inlet; and a pump ring disposed in and in fluid communication with the inner volume, the pump ring comprising an upper chamber fluidly coupled to a lower chamber, and a second outlet fluidly coupled to the lower chamber to selectively open or seal the inner volume to or from the second outlet.

Methods and apparatus for in-situ cleaning of a process chamber

Described are apparatus and methods for processing semiconductor wafers so that a film can be deposited on the wafer and the film can be UV treated without the need to move the wafer to a separate location for treatment. The apparatus and methods include a window which is isolated from the reactive gases by a flow of an inert gas.

Deposition chambers with UV treatment and methods of use

An apparatus and a method for depositing materials, and more particularly a vapor deposition chamber configured to deposit a material during a plasma-enhanced process are provided. In one embodiment a chamber comprises a chamber body defining a process volume, a substrate support disposed in the process volume and configured to support one or more substrates, a process lid assembly disposed over the substrate support, wherein the process lid assembly has a plasma cavity configured to generate a plasma and provide one or more radical species to the process volume, a RF (radio frequency) power source coupled to the gas distribution assembly, a plasma forming gas source coupled with the process lid assembly, and a reactant gas source coupled with the process lid assembly.

Growing community of inventors

Glen Ellyn, IL, United States of America

Nicholas Ryan Denny