Umicore Ag & Co. Kg

Sk Specialty Co., Ltd

Nicholas Rau

Ralf Karch

Angelino Doppiu

Eileen Woerner

Annika Frey

Joerg Sundermeyer

Wolf Schorn

Andreas Rivas Nass

Henrik Schumann

Jörg Sundermeyer

Timo Ebert

The invention relates to a method for producing MoOClunder inert conditions, comprising the steps of: The invention also relates to high-purity MoOCl, the use thereof, and electronic components.

Production of MoOCl

The invention relates to the synthesis and provision of a new class of volatile metal organic compounds based on bis(alkylimine)glyoxal and bis(dialkylhydrazone)glyoxal ligands in combination with cyclopentadienide and alkyl ligands for use in ALD and CVD processes.

Metal organic compounds

Metal complexes of formula (I) are described:[M(L)(L)(hydra)]  formula (I)

Metal complexes for gas-phase thin-film deposition

The invention relates to compounds in accordance with the general formula [Ru(arene)(R&#x2014;N&#x2550;CR&#x2014;CR&#x2550;N&#x2014;R)] or [Ru(arene)((R,R)N&#x2014;N&#x2550;CR&#x2014;CR&#x2550;N&#x2014;N(R,R))]. In this case, arene is selected from the group consisting of mononuclear and polynuclear arenes and heteroarenes. R, R, RH, Rand R-Rare independently selected from the group consisting of H, an alkyl radical (C1-C10) and an aryl radical. It further relates to methods for the production of these compounds, compounds obtainable according to these methods, their use and a substrate having on a surface thereof a ruthenium layer or a layer containing ruthenium. In addition, the invention relates to a method for producing compounds [Ru(arene)X]2, wherein arene is selected from the group consisting of mononuclear and polynuclear arenes and X=halogen, compounds of this type obtainable according to this method, and their use. The aforementioned ruthenium(O) compounds can be produced in a simple, cost-effective and reproducible manner with a high degree of purity and good yield. Due to their high degree of purity, they are suitable for use as ruthenium(O) precursors.

Organometallic compounds for the manufacture of a semiconductor element or electronic memory

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Marburg, Germany

Nicholas Rau