Asml Netherlands B.v.

Nicholas Peter Waterson

Remco Van De Meerendonk

Thibault Simon Mathieu Laurent

Martijn Houben

Niek Jacobus Johannes Roset

Siegfried Alexander Tromp

Yuri Johannes Gabriël Van De Vijver

Marcus Martinus Petrus Adrianus Vermeulen

Gijs Kramer

Coen Hubertus Matheus Baltis

Justin Johannes Hermanus Gerritzen

Simon Karel Ravensbergen

Vincentius Fransiscus Cloosterman

Johannes Henricus Wilhelmus Jacobs

Franciscus Johannes Joseph Janssen

Antonius Johannus Van Der Net

Daniel Jozef Maria Direcks

Roger Wilhelmus Antonius Henricus Schmitz

Gerardus Arnoldus Hendricus Franciscus Janssen

Sven Pekelder

Joost André Klugkist

Jaap Oudes

Güneş Nakiboğlu

Johannes Franciscus Martinus Van Santvoort

Güneş Nak{dot Over (i)}boğlu

Philippe Jacqueline Johannes Hubertus Anthonius Habets

Joris Dominicus Bastiaan Johannes Van Den Boom

Dirk Martinus Gerardus Petrus Wilhelmus Jakobs

Steve Gregory Brust

Shravan Kottapalli

Jeroen Peterus Johannes Van Lipzig

Güneş Nakiboǧlu

A temperature conditioning system using conditioning liquid to condition a temperature of an object, the system including a conditioning conduit, a return conduit, a supply chamber, and a discharge chamber, wherein the temperature conditioning system is arranged to provide a static pressure difference between the supply chamber outlet and the discharge chamber inlet to create a flow through the conditioning conduit. A lithography apparatus and a method of temperature conditioning an object is also described.

Temperature conditioning system, a lithographic apparatus and a method of temperature conditioning an object

A passive flow induced vibration reduction system for use in a temperature conditioning system that controls the temperature of at least one component within a lithographic apparatus. This FIV reduction system includes: a conduit that provides a flow path for a liquid through the system; a liquid filled cavity in fluid connection with the conduit, wherein the fluid connection is provided via one or more openings in the wall of the conduit; a membrane configured such that it separates the liquid in the liquid filled cavity from a gas at a substantially ambient pressure and the membrane is configured such that compliance of the membrane reduces at least low frequency flow induced vibrations in the liquid flowing through the conduit; and an end-stop located on the gas side of the membrane, wherein the end-stop is configured to limit an extent of deflection of the membrane.

Temperature conditioning system

An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.

Extraction body for lithographic apparatus

An apparatus comprising a heat-sensitive device (F); a radiative element (RE), the radiative element in operation generating first electromagnetic radiation (ER), the first radiation propagating towards the heat-sensitive device; and a radiation-shielding device () arranged between the radiative element and the heat-sensitive device such that, in operation, the first radiation impinges on the radiation-shielding device. The radiation-shielding device comprises a first shield element () having a first fluid channel () arranged therein, the first shield element having a first surface () and a second surface (), the first surface being arranged closer to the radiative element than the second surface; and a second shield element () having a second fluid channel () arranged therein, the second shield element having a third surface () and a fourth surface (), the third surface being arranged closer to the radiative element than the fourth surface. The first shield element is arranged closer to the radiative element than the second shield element and the second shield element is arranged closer to the heat-sensitive device than the first shield element, the first shield element and the second shield element spaced apart from each other and the second surface and the third surface opposing each other.

Radiation shielding device and apparatus comprising such shielding device

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Duizel, Netherlands

Nicholas Peter Waterson