Bell Communications Research, Inc.

Nicholas C Andreadakis

Robert B Marcus

Tirunelveli S Ravi

Tapered silicon structures, of interest for use, e.g., in atomic force microscopes, in field-emission devices, and in solid-state devices are made using silicon processing technology. Resulting tapered structures have, at their tip, a radius of curvature of 10 nanometers or less.

Device including a tapered microminiature silicon structure

Tapered silicon structures, of interest for use, e.g., in atomic force microscopes, in field-emission devices, and in solid state devices are made using silicon processing technology. Resulting tapered structures have, at their tip, a radius of curvature of 10 nanometers or less. Such preferred silicon structures are particularly suited as electron emitters in display devices.

Method for making tapered microminiature silicon structures

Four parallel spaced-apart substrates are arranged in a stack to provide three gas-containing spaces therebetween. Orthogonally disposed electrodes and dielectric barrier ribs formed on each facing surface of the substrates define individually addressable cells within each gas-containing space. Each picture element comprises three vertically aligned cells each of which contains a gas that, when activated, emits red, green or blue light, respectively. The non-phosphor full-color plasma display device thus formed is characterized by high-resolution and useful memory margins at high frequencies.

Non-phosphor full-color plasma display device

A method of fabricating a display panel on a substrate material of soda-lime float glass. A dielectric layer composed of a mixture of lead, silicon and aluminum is deposited on the substrate to a thickness of from 25 to 150 microns. A masking pattern is defined on the surface of the dielectric layer where plasma display cavities are to be formed. Openings are etched in the dielectric layer with fluoboric acid to geometries no larger than approximately 0.15 mm wide by 0.15 mm thick at regions defined by the masking pattern, the openings extending to the major surface of the substrate and forming a plasma display cavity. A cover is provided over the cavity to form an enclosed envelope containing a noble gas. A phosphor is provided in the plasma display cavity together with electrodes adjacent to the cavity for ionizing the gas and exciting the phosphor.

Process for fabrication of high resolution flat panel plasma displays

A high-resolution flat-panel plasma display device made in solid-state form and designed for large-area full-color applications includes first and second sets of orthogonally disposed electrodes on a substrate to which a phosphor-containing faceplate is sealed. The electrodes of one set are respectively suspended relatively high above the substrate surface on spaced-apart longitudinally extending dielectric ridges.

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White House Station, NJ, United States of America

Nicholas C Andreadakis