Varian Semiconductor Equipment Associates, Inc.

Nicholas A Venuto

Joseph C Olson

Anthony Renau

Kasegn D Tekletsadik

Leo Klos

Charles L Stanley

Semaan Y Fersan

Scott W Nickerson

An electrical bushing is disclosed for use in high voltage cryogenic applications. The bushing including first and second bushing portions and an electrical conductor disposed longitudinally within the portions. The electrical conductor has a first terminal extending from the first bushing portion and a second terminal extending from the second bushing portion. The first terminal is configured to couple to a first electrical element at ambient temperature, and the second terminal is configured to couple to a second electrical element at cryogenic temperature. The first and second bushing portions comprise a base insulator material, while the first bushing portion further comprises an environmental protection layer disposed over the base insulator portion.

High voltage busing for cryogenics applications

A cathode in an indirectly heated cathode ion source is supported by at least one rod or pin. The cathode is preferably in the form of a disk, and the support rod is smaller in diameter than the disk to limit thermal conduction and radiation. In one embodiment, the cathode is supported by a single rod at or near its center. The support rod may be held by a spring-action clamp for simple and reliable clamping and unclamping. The disk shaped cathode and the support rod may be fabricated as a single piece. A filament that emits electrons thermionically may be disposed around the rod in close proximity to the cathode.

Cathode assembly for indirectly heated cathode ion source

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Billerica, MA, United States of America

Nicholas A Venuto