Applied Materials, Inc.

Motorola Mobility LLC

Motorola Corporation

Nety M Krishna

Byung-Sung Kwak

Stefan Bangert

Omkaram Nalamasu

Byung Sung Kwak

Steven Verhaverbeke

Majeed Foad

Kaushal Kishore Singh

Mahalingam Venkatesan

Michael Wayne Stowell, Jr

Dieter Haas

Winfried Hoffmann

Vijay D Parkhe

Umesh M Kelkar

William J Dauksher

Kurt W Eisenbeiser

Wei Yang

Marc O Schweitzer

Nitin Khurana

Karl J Armstrong

Jon J Candelaria

Jose Manuel Dieguez-Campo

Virendra V S Rana

Michael R Snure

Chris Eberspacher

Ashutosh Tiwari

Michael König

Nalin Patadia

Michael Koenig

Ashok K Das

Byung Sung Leo Kwak

Scot Petitt

Byung-sung Leo Kwak

Jon Candelaria

José Manuel Dieguez-Campo

The present disclosure generally provides a method for forming a photovoltaic device including evaporating a source material to form a large molecule processing gas and flowing the large molecule processing gas through a gas distribution showerhead and into a processing area of a processing chamber having a substrate therein. The method includes generating a small molecule processing gas, and reacting the small molecule processing gas with a film already deposited on a substrate surface to form a semiconductor film. Additionally, apparatuses that may use the methods are also provided to enable continuous inline CIGS type solar cell formation.

Methods for plasma activation of evaporated precursors in a process chamber

The present invention generally provides a method for forming a photovoltaic device including evaporating a source material to form a large molecule processing gas and flowing the large molecule processing gas through a gas distribution showerhead and into a processing area of a processing chamber having a substrate therein. The method includes generating a small molecule processing gas, and reacting the small molecule processing gas with a film already deposited on a substrate surface to form a semiconductor film. Additionally, apparatuses that may use the methods are also provided to enable continuous inline CIGS type solar cell formation.

Plasma enhanced thermal evaporator

A method for patterning a magnetic thin film on a substrate includes: providing a pattern about the magnetic thin film, with selective regions of the pattern permitting penetration of energized ions of one or more elements. Energized ions are generated with sufficient energy to penetrate selective regions and a portion of the magnetic thin film adjacent the selective regions. The substrate is placed to receive the energized ions. The portions of the magnetic thin film are rendered to exhibit a magnetic property different than selective other portions. A method for patterning a magnetic media with a magnetic thin film on both sides of the media is also disclosed.

Patterning of magnetic thin film using energized ions

This invention contemplates integrating laser scribing/patterning the component layers of electrochromic devices by directly removing (ablating) the material of the component layers. To minimize redeposition of laser ablated material and particulate formation on device surfaces a number of approaches may be used: (1) ablated material generated by the focused laser patterning may be removed by vacuum suction and/or application of an inert gas jet in the vicinity of the laser ablation of device material; (2) spatial separation of the edges of layers and patterning of lower layers prior to deposition of upper layers; and (3) the laser patterning step may be performed by a laser beam focused directly on the deposited layers from above, by a laser beam directed through the transparent substrate, or by a combination of both.

Electrochromic devices

Thin-film battery methods for complexity reduction are described. Processing equipment arrangements suitable to support thin-film battery methods for complexity reduction are also described. Cluster tools to support thin-film battery methods for complexity reduction are also described.

Thin-film battery methods for complexity reduction

A method of fabricating a layer of a thin film battery comprises providing a sputtering target and depositing the layer on a substrate using a physical vapor deposition process enhanced by a combination of plasma processes. The deposition process may include: (1) generation of a plasma between the target and the substrate; (2) sputtering the target; (3) supplying microwave energy to the plasma; and (4) applying radio frequency power to the substrate. A sputtering target for a thin film battery cathode layer has an average composition of LiMNZ, wherein 0.20&#x3e;{b/(a+b)}&#x3e;0 and the ratio of a to c is approximately equal to the stoichiometric ratio of a desired crystalline structure of the cathode layer, N is an alkaline earth element, M is selected from the group consisting of Co, Mn, Al, Ni and V, and Z is selected from the group consisting of (PO), O, F and N.

Thin film batteries and methods for manufacturing same

A method for patterning a magnetic thin film on a substrate includes: providing a pattern about the magnetic thin film, with selective regions of the pattern permitting penetration of energized ions of one or more elements. Energized ions are generated with sufficient energy to penetrate selective regions and a portion of the magnetic thin film adjacent the selective regions. The substrate is placed to receive the energized ions. The portion of the magnetic thin film is subjected to thermal excitation. The portions of the magnetic thin film are rendered to exhibit a magnetic property different than selective other portions. A method for patterning a magnetic media with a magnetic thin film on both sides of the media is also disclosed.

Patterning of magnetic thin film using energized ions and thermal excitation

Methods for fabrication of copper delafossite materials include a low temperature sol-gel process for synthesizing CuBOpowders, and a pulsed laser deposition (PLD) process for forming thin films of CuBO, using targets made of the CuBOpowders. The CuBOthin films are optically transparent p-type semiconductor oxide thin films. Devices with CuBOthin films include p-type transparent thin film transistors (TTFT) comprising thin film CuBOas a channel layer and thin film solar cells with CuBOp-layers. Solid state dye sensitized solar cells (SS-DSSC) comprising CuBOin various forms, including 'core-shell' and 'nano-couple' particles, and methods of manufacture, are also described.

Copper delafossite transparent P-type semiconductor thin film devices

Embodiments of the present invention generally provide methods for forming conductive structures on the surfaces of a solar cell. In one embodiment, conductive structures are formed on the front surface of a solar cell by depositing a sacrificial polymer layer, forming patterned lines in the sacrificial polymer via a fluid jet, depositing metal layers over the front surface of the solar cell, and performing lift off of the metal layers deposited over the sacrificial polymer by dissolving the sacrificial polymer with a water based solvent. In another embodiment, conductive structures are formed on the back surface of a solar cell by depositing a sacrificial polymer layer, forming patterned lines in the sacrificial polymer via a fluid jet, depositing a metal layer over the back surface of the solar cell, and performing lift off of the metal layer deposited over the sacrificial polymer by dissolving the sacrificial polymer with a water based solvent, and completing selective metallization of the remaining metal lines.

Solar cell patterning and metallization

A method of manufacturing electrically tintable window glass with a variety of sizes and functionalities is described. The method comprises: (a) providing a large format glass substrate; (b) fabricating a plurality of electrically tintable thin film devices on the large format glass substrate; (c) cutting the large format glass substrate into a plurality of electrically tintable pieces, each electrically tintable piece including one of the plurality of electrically tintable thin film devices; (d) providing a plurality of window glass pieces; (e) matching each one of the plurality of electrically tintable pieces with a corresponding one of the plurality of window glass pieces; and (f) laminating each of the matched electrically tintable pieces and window glass pieces. The lamination may result in the electrically tintable device either being sandwiched between the glass substrate and the window glass piece or on the surface of the laminated pieces. The electrically tintable device is an electrochromic device.

Laminated electrically tintable windows

Concepts and methods are provided to reduce the cost and complexity of thin film battery (TFB) high volume manufacturing by eliminating and/or minimizing the use of conventional physical (shadow) masks. Laser scribing and other alternative physical maskless patterning techniques meet certain or all of the patterning requirements. In one embodiment, a method of manufacturing thin film batteries comprises providing a substrate, depositing layers corresponding to a thin film battery structure on the substrate, the layers including, in order of deposition, a cathode, an electrolyte and an anode, wherein at least one of the deposited layers is unpatterned by a physical mask during deposition, depositing a protective coating, and scribing the layers and the protective coating. Further, the edges of the layers may be covered by an encapsulation layer. Furthermore, the layers may be deposited on two substrates and then laminated to form the thin film battery.

Method for high volume manufacturing of thin film batteries

This invention contemplates the use of laser patterning/scribing in electrochromic device manufacture, anywhere during the manufacturing process as deemed appropriate and necessary for electrochromic device manufacturability, yield and functionality, while integrating the laser scribing so as to ensure the active layers of the device are protected to ensure long term reliability. It is envisaged that the laser is used to pattern the component layers of electrochromic devices by directly removing (ablating) the material of the component layers. The invention includes a manufacturing method for an electrochromic device comprising one or more focused laser patterning steps. To minimize redeposition of laser ablated material and particulate formation on device surfaces a number of approaches may be used: (1) ablated material generated by the focused laser patterning may be removed by vacuum suction and/or application of an inert gas jet in the vicinity of the laser ablation of device material; (2) spatial separation of the edges of layers and patterning of lower layers prior to deposition of upper layers; and (3) the laser patterning step may be performed by a laser beam focused directly on the deposited layers from above, by a laser beam directed through the transparent substrate, or by a combination of both.

Method for manufacturing electrochromic devices

The invention relates to a cleaning method in which from a vacuum coating chamber () of a coating installation () for the coating of substrates () with alkali- or alkaline earth-metals, residues of alkali- or alkaline earth-metals are removed. For this purpose into the chamber () a gas from the group of N, Oor air is introduced, which reacts with the alkali- or alkaline earth-metals to form the corresponding solid compounds. Water can additionally be introduced into the vacuum coating chamber (). After the alkali- or alkaline earth-metals have reacted with the gas, the corresponding solid compound is removed from the vacuum coating chamber.

Arrangement and method for removing alkali- or alkaline earth-metals from a vacuum coating chamber

Disclosed is an invention that uses a coaxial microwave antenna as a primary plasma source in PVD. The coaxial microwave antenna is positioned inside a sputtering target. Instead of using a cathode assist in sputtering, microwaves generated from the coaxial microwave antenna may leak through the sputtering target that comprises a dielectric material to form microwave plasma outside the sputtering target. To further enhance plasma density, a magnetron or a plurality of magnetrons may be added inside the target to help confine secondary electrons. An electric potential may be formed between adjacent magnetrons and may further enhance ionization. To achieve directional control of the generated microwaves, a shield that comprises a dielectric material or dielectric material coated metal may be added proximate the coaxial microwave antenna. Furthermore, for high utilization of expensive target materials, a target can rotate to improve the utilization efficiency.

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Sunnyvale, CA, United States of America

Nety M Krishna