Nissan Chemical Industries Limited

Niigata University

Natsumi Murakami

Yoshinari Koyama

Masaaki Ozawa

Taku Kato

Naoya Nishimura

Tomoki Furukawa

Ai Miyamoto

Masayoshi Suzuki

Takahiro Kaseyama

Masahiro Hida

Norio Tsubokawa

Masashi Abe

Shigeru Mitsui

Yasufumi Shikauchi

Tomoya Maeta

Daiki Iijima

Takeshi Yamauchi

Koyama Yoshinari

Miyamoto Ai

The aminosilane-modified colloidal silica dispersion contains colloidal silica particles having surfaces to which there are bound a first silyl group represented by the following formula (1): RSi(OR)O&#x2014; and a second silyl group represented by the following formula (2): RSi(OR)O&#x2014; and, as a dispersion medium, a mixed solvent formed of a polar solvent S1 having a dielectric constant at 20&#xb0; C. of 15 or higher and lower than 60 and a non-polar solvent S2 having a dielectric constant at 20&#xb0; C. of 1 or higher and lower than 15, at a mass ratio (S1/S2) of 0.3 to 6.

Aminosilane-modified colloidal silica dispersion and method of manufacturing same

A coating film-forming composition includes a hydrolysis-condensation product of a hydrolyzable silane and fine inorganic particles subjected to a special dispersion treatment, that can be formed into a highly heat-resistant, highly transparent coating film capable of exhibiting a high refractive index and having a large thickness and excellent storage stability as a coating composition; and a process for producing the coating film-forming composition.

Coating film-forming composition and process for producing the same

A dispersion that inorganic oxide microparticles may be dispersed at a high concentration in a solvent, a composition for film formation having high transparency, high refractive index and adhesion to a base layer. Inorganic oxide microparticles wherein an amphiphilic organosilicon compound having one or more selected from a polyoxyethylene group, a polyoxypropylene group, or a polyoxybutylene group as a hydrophilic group, and one or more selected from a Calkylene group or a vinylene group as a hydrophobic group bonded to a surface of modified metal oxide colloidal particles (C) having a primary particle diameter of 2 to 100 nm, the modified metal oxide colloidal particles wherein a surface of metal oxide colloidal particles (A) having a primary particle diameter of 2 to 60 nm as a nucleus is coated with a coating material (B) including metal oxide colloidal particles having a primary particle diameter of 1 to 4 nm.

Inorganic oxide microparticles having amphiphilic organic silane compound bonded thereto, organic solvent dispersion thereof, and composition for film formation

This film-forming composition includes, for example, a polymer, crosslinking agent and light-diffusing agent that contain a triazine ring-containing repeating unit structure such as that represented formula (17), and is able to provide cured films with good light diffusing properties. Furthermore, this film-forming composition, which includes the same polymer, crosslinking agent and fine inorganic particles having a cross-linkable functional group, is able to provide cured films with good high temperature and high humidity resistance. 

Film-forming composition

A film-forming composition including a triazine ring-containing hyperbranched polymer with a repeating unit structure indicated by formula (1), and inorganic micro particles is provided. This enables the provision of a film-forming composition capable of hybridizing without reducing dispersion of the inorganic micro particles in a dispersion fluid, capable of depositing a coating film with a high refractive index, and suitable for electronic device film formation. In the formula, R and R' are mutually independent and indicate a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, or an aralkyl group, and Ar indicates a divalent organic group including either an aromatic ring or a heterocyclic ring, or both.

A film-forming composition including a triazine ring-containing hyperbranched polymer with a repeating unit structure indicated by formula (1), and inorganic micro particles is provided. This enables the provision of a film-forming composition capable of hybridizing without reducing dispersion of the inorganic micro particles in a dispersion fluid, capable of depositing a coating film with a high refractive index, and suitable for electronic device film formation. (In the formula, R and R' are mutually independent and indicate a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, or an aralkyl group, and Ar indicates a divalent organic group including either an aromatic ring or a heterocyclic ring, or both.)

There is provided provide a method for efficiently producing a rutile type titanium sol having a particle diameter based on dynamic light scattering method of 5 nm to 100 nm that is excellent in dispersibility. The method for producing a rutile type titanium oxide sol comprising: process (a): mixing metastannic acid, a titanium alkoxide, a quaternary ammonium hydroxide, oxalic acid, and water so as to contain 0.02 moles to 0.8 moles of tin atoms, 0.1 moles to 3.5 moles of the quaternary ammonium hydroxide, and 0.1 moles to 8.0 moles of the oxalic acid with respect to 1 mole of titanium atoms of the titanium alkoxide to prepare a titanium-containing aqueous solution with a concentration in terms of TiOof 0.1% by mass to 15% by mass; and process (b): subjecting the titanium-containing aqueous solution obtained in process (a) to a hydrothermal treatment at a temperature from 100&#xb0; C. to 170&#xb0; C.

Method for producing rutile type titanium oxide sol

A method for producing a rutile titanium oxide sol having a particle diameter measured by dynamic light scattering of 5 nm to 100 nm, the method comprising: a process (a): mixing a tin oxalate aqueous solution, a titanium alkoxide, oxalic acid, a quaternary ammonium hydroxide, and water, while adjusting, per mole of titanium atoms, a proportion of tin atoms to be from 0.1 mol to 0.8 mol, a proportion of the oxalic acid to be from 0.01 mol to 5 mol, and a proportion of the quaternary ammonium hydroxide to be from 0.1 mol to 3.5 mol to prepare a titanium-containing aqueous solution having a concentration in terms of TiOof 0.1% by mass to 15% by mass; and a process (b): performing hydrothermal treatment on the titanium-containing aqueous solution produced in the process (a) at 100&#xb0; C. to 200&#xb0; C.

Growing community of inventors

Sodegaura, Japan

Natsumi Murakami