Hoechst Japan Limited

Natsumi Kawasaki

Satoru Funato

Georg Pawlowski

Hiroshi Okazaki

Yoshiaki Kinoshita

Seiya Masuda

Munirathna Padmanaban

Radiation-sensitive composition and recording medium using the same

A radiation-sensitive composition is disclosed which includes (a) a binder insoluble in water but soluble in or capable of being swelled in an aqueous alkali solution, (b) a dissolution inhibitor composed of (b1) a poly(N,O-acetal) having a general formula: ##STR1## wherein R.sup.3 is alkyl or substituted or unsubstituted aryl, R.sup.4 is a divalent group selected from alkylene, cycloalkylene, alkene or alkyne, R.sup.5 is alkyl, alkene, alkyne or cycloalkyl, X is --OCO--, --CO-- or --NHCO--, and p is a number not less than 1, and/or (b2) a phenol compound having a hydroxyl group which is protected by a group which can be cleaved in the presence of an acid, (c) a photosensitive compound capable of generating an acid when exposed to an active radiation, (d) a base capable of being decomposed when exposed to an active radiation to form a neutral compound derived therefrom, (e) a plasticizer, and (f) a solvent.

Radiation-sensitive composition containing plasticizer

A radiation-sensitive composition is disclosed which includes:

Radiation-sensitive composition

Growing community of inventors

Saitama, Japan

Natsumi Kawasaki