Kao Corporation

Natsuko Toshida

Naoko Yamamoto

Masaki Shimizu

Hiroki Takeuchi

Masahiro Miyaki

Jurgen Benade

Naoko Yamatomo

Masaki Shimuzi

Cleansing compositions include a mixture of alkyl ether carboxylic acids and/or salts thereof, each having a structure according to formula (1):R&#x2014;O&#x2014;(CHCHO)&#x2014;CH&#x2014;COOM&#x2003;&#x2003;(1)where Ris an alkyl group having 4 to 22 carbon atoms, n is a number of from 0 to 20, and M is a hydrogen atom, alkali metal, alkaline earth metal, ammonium, or organic ammonium. The mixture includes alkyl ether carboxylic acids and/or salts having at least two different alkyl groups R, an average carbon number of alkyl groups Rof alkyl ether carboxylic acids and/or salts in the mixture is from 10.8 to 12.5, the mixture includes alkyl ether carboxylic acids and/or salts in which n=0 in an amount of from 8 to 27% by weight based on a total weight of the mixture, the mixture includes alkyl ether carboxylic acids and/or salts in which n=1 and alkyl ether carboxylic acids and/or salts in which n=2 in an amount of from 28 to 38% by weight based on the total weight of the mixture, and the mixture includes alkyl ether carboxylic acids and/or salts in which n&#x2266;6 in an amount of at least 10% by weight based on the total weight of the mixture.

Cleansing composition

A skin cleansing composition contains, in addition to water, the following ingredients (A) to (D):

Skin cleansing composition comprising a polyoxyethylene alkylether sulfate, ether carboxylic acid-type surfactant, alkyl polyglycoside and a higher fatty acid or higher alcohol

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Wakayama, Japan

Natsuko Toshida