Tokyo Ohka Kogyo Co., Ltd.

Natsuko Maruyama

Akiya Kawaue

Shinichi Hidesaka

Hideo Hada

Yoshiyuki Utsumi

Tsuyoshi Nakamura

Takeshi Iwai

Hiroaki Shimizu

Takehiro Seshimo

Tsuyoshi Kurosawa

Kensuke Matsuzawa

A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) containing a compound having a cation moiety represented by general formula (I) (in the formula, Rrepresents a hydrogen atom or an organic group of 1 to 30 carbon atoms which may have a substituent; and Qrepresents a single bond or a divalent linking group). 

Resist composition, method of forming resist pattern, novel compound and acid generator

A compound represented by formula (I); and a compound represented by formula (b1-1): wherein X represents &#x2014;O&#x2014;, &#x2014;S&#x2014;, &#x2014;O&#x2014;R&#x2014; or &#x2014;S&#x2014;R&#x2014;, wherein each of Rand Rindependently represents an alkylene group of 1 to 5 carbon atoms; Rrepresents an alkyl group of 1 to 6 carbon atoms, an alkoxy group of 1 to 6 carbon atoms, a halogenated alkyl group of 1 to 6 carbon atoms, a halogen atom, a hydroxyalkyl group of 1 to 6 carbon atoms, a hydroxyl group or a cyano group; a represents an integer of 0 to 2; Qrepresents an alkylene group of 1 to 12 carbon atoms or a single bond; Yrepresents an alkylene group of 1 to 4 carbon atoms or a fluorinated alkylene group; Mrepresents an alkali metal ion; and Arepresents an organic cation.

Resist composition, method of forming resist pattern, novel compound and method of producing the same, and acid generator

Growing community of inventors

Kawasaki, Japan

Natsuko Maruyama