University of Colorado

Drs Network & Imaging Systems, LLC

Nathan Thomas Eigenfeld

Steven McClellan George

George Dee Skidmore

Victor M Bright

Joseph J Brown

Jason M Gray

Jonas Gertsch

The present invention relates to the unexpected discovery of novel methods of preparing nanodevices and/or microdevices with predetermined patterns. In one aspect, the methods of the invention allow for engineering structures and films with continuous thickness equal to or less than 50 nm.

Atomic layer etching on microdevices and nanodevices

The present invention relates to novel nano- and micro-electromechanical devices and novel methods of preparing them. In one aspect, the invention includes methods of preparing a nanodevice. In certain embodiments, the methods comprise coating a polymer layer with a first at least one thin solid material layer using atomic layer deposition (ALD), thus forming an ALD-generated layer. In other embodiments, the methods comprise patterning the first at least one thin solid material layer to form a nanodevice. In yet other embodiments, the methods comprise releasing the nanodevice from the polymer layer.

Methods of preparing nanodevices

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Boulder, CO, United States of America

Nathan Thomas Eigenfeld