Ascend Performance Materials Operations LLC

Natasha Dean

Albert E Ortega

Wai-Shing Yung

Vikram Gopal

A filter or mask structure, comprising a first face layer comprising a polymer and having a face basis weight, a second outer layer comprising a polymer and having an outer basis weight less than 34 gsm, and a third outer layer comprising a polymer and having a third basis weight and disposed between the first face layer and the second outer layer. At least one of the layers further comprises an AM/AV compound. The mask structure demonstrates anefficacy log reduction greater than 4.0, as measured in accordance with ASTM E3160 (2018) and a particulate filtration efficiency greater than 90%, as measured in accordance with ASTM F2299-03R17.

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Houston, TX, United States of America

Natasha Dean