Lpe S.p.a.

E.t.c. Epitaxial Technology Center Srl

Natale Speciale

Franco Preti

Vincenzo Ogliari

Danilo Crippa

Gianluca Valente

Marco Puglisi

Srinivas Yarlagadda

Giuseppe Tarenzi

Mario Preti

The present invention relates to a reaction chamber of an epitaxial reactor that essentially consists of a quartz piece; the quartz piece comprises a quartz piece portion () having an internal cavity () defined by walls (A,B,C,D); the cavity () comprises a reaction and deposition zone () of the epitaxial reactor; the zone () is adapted to house a susceptor () to be heated therein; the reaction chamber also comprises a quartz component () arranged close to said walls (A,B,C,D) in such a manner as to form a counterwall and to be a wall of said zone ().

Reaction chamber of an epitaxial reactor and reactor that uses said chamber

A system for an apparatus of the type adapted to treat substrates and/or wafers is described and comprises a stationary base element and a movable support for at least one substrate or at least one wafer, the support being rotatable above the element about a stationary axis; a chamber, and at least one duct is provided for the admission of at least one gas-flow to the chamber in order to raise the support; the system also comprises means for converting the flow of gas into the chamber into rotation of the support.

Support system for a treatment apparatus

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Paderno Dugnano, Italy

Natale Speciale