Tokyo Electron Limited

Tokyo Electron Kyushu Limited

Naruaki Iida

Suguru Enokida

Hideki Kajiwara

Masami Akimoto

Shinichi Hayashi

Masanori Tateyama

Kousei Ide

Issei Ueda

Yuji Matsuyama

Hidetami Yaegashi

Akihiro Fujimoto

Katsuhiro Morikawa

Takashi Takekuma

Yoichi Deguchi

Masahiro Nakaharada

Yasunori Kawakami

Takahide Fukuda

Yuji Yoshimoto

Hiroyuki Matsukawa

Seiji Kozawa

Hideaki Gotou

Mitsuhiro Nanbu

Tomoko Ishimoto

Akira Miyata

Junichi Kitano

Yuichi Douki

Kazutoshi Yoshioka

Tokutarou Hayashi

Takayuki Katano

Yasuhiro Sakamoto

Seiji Nakano

Kohei Kawakami

Tsuyoshi Watanabe

Hiroyuki Kudou

Hidekazu Kiyama

Tohru Azuma

Shinichi Mizushino

Jun Ohkura

Shinichiro Yamanaka

Yuya Yonemitsu

Kousuke Yoshihara

Takahiro Kitano

Takayuki Toshima

Yoshio Kimura

Norihisa Koga

Nobuo Konishi

Shinji Nagashima

Kazuhiro Takeshita

Masato Hayashi

Hiroaki Inadomi

Masami Yamashita

Satoru Shimura

Masatoshi Deguchi

Jun Ookura

Michiaki Matsushita

Norio Semba

Akihiro Teramoto

Hiroshi Shinya

Hidefumi Matsui

Keizo Hasebe

Masashi Tsuchiyama

Yuzo Ohishi

Kazuhiko Ito

Yoshitaka Konishi

Kohei Noguchi

Michio Kinoshita

Mitsuteru Yano

Hiroyuki Iwaki

Junnosuke Maki

Eiji Yamaguchi

Kouji Harada

Yasunori Toyoda

Hiroki Harada

Yo Suzuki

Toru Aoyama

Kenji Yasuda

Kenji Iizuka

Kazuya Matsushita

Yukinori Kataoka

Yukio Shigaki

A substrate processing apparatus includes: a carrier block including carrier placement parts and configured to load/unload a substrate into/from a carrier; a processing block provided on one side of the carrier block to process the substrate; first and second carrier placement parts of the carrier placement parts and provided side by side in a front-rear direction in a plan view; substrate placement parts provided to be arranged step by step vertically on one side of a substrate transfer region formed between the first and second carrier placement parts; a first substrate transfer mechanism provided in the substrate transfer region to deliver the substrate between the carrier of the first carrier placement part and a first substrate placement part of the substrate placement parts; and a second substrate transfer mechanism for moving upward and downward so as to deliver the substrate between first and second substrate placement parts.

Substrate processing apparatus and substrate processing method

A substrate processing apparatus includes: a loading/unloading block; a processing station provided on one of left and right sides of the loading/unloading block; a relay block provided on one of left and right sides of the processing station; processing blocks provided side by side in a left-right direction to form the processing station, each of the processing blocks including a processing module configured to perform a process on the substrate and a main transfer mechanism configured to deliver the substrate to the processing module; and bypass transfer mechanisms provided separately from the main transfer mechanism and provided respectively for the processing blocks arranged side by side in the left-right direction to transfer the substrate between left and right blocks, wherein bypass transfer paths for the substrate transferred by the plurality of bypass transfer mechanisms have heights different from each other, and partially overlap each other in a plan view.

A substrate transfer device includes: a substrate holder configured to transfer a substrate to one of a plurality of processing modules that process the substrate; a base provided to be connected to the substrate holder; and a lift configured to move up and down the base. The lift includes: a plurality of rails and a plurality of seal belts arranged side by side in a left-right direction and extending in a longitudinal direction, a driver shared by the rails and configured to move up and down the base along an extending direction of each of the rails, a slider configured to move up and down while being supported by the lift and physically connected to the plurality of rails, and a connecting member. A portion of each seal belts is opened, and the slider and the base are connected to each other via the connecting member provided in the opening.

Substrate transfer device including housing provided with fan

An apparatus includes substrate holders each configured to hold a substrate, a first nozzle provided for each substrate holder and for discharging a first processing liquid to the substrate at a first position, a second nozzle provided to be shared by the substrate holders and for discharging a second processing liquid to the substrate at a second position, a third nozzle provided for each substrate holder and for discharging a third processing liquid to the substrate at a third position while the first and second processing liquids are not supplied to the substrate, first to third standby parts for respectively allowing the first to third nozzles to wait outside a substrate holding region, a turning mechanism for turning the first nozzle between the first standby part and the first position, and a linear motion mechanism for linearly moving the third nozzle between the third standby part and the third position.

Coating apparatus and coating method

A substrate transfer mechanism includes: an arm base main body provided with a first driver; a lift configured to move up and down the arm base main body; a first arm extending transversely from a lower side of the arm base main body, and having a tip end that pivots around a vertical axis with respect to the arm base main body by the first driver; a second arm extending transversely from an upper side of the tip end of the first arm, and having a tip end that pivots around a vertical axis with respect to the first arm along with the pivoting of the first arm; and a substrate holder provided on an upper side of the tip end of the second arm, and configured to rotate around a vertical axis with respect to the second arm.

Substrate transfer mechanism and substrate transferring method

A substrate transfer mechanism for transferring a substrate to each of a plurality of stacked processing modules that process the substrate includes an arm base provided with a first driver, a lift configured to move up and down the arm base, a first arm extending transversely from a lower side of the arm base, and having a tip end that pivots around a vertical axis with respect to the arm base by the first driver, a second arm extending transversely from an upper side of the tip end of the first arm, and having a tip end that pivots around a vertical axis with respect to the first arm along with the pivoting of the first arm, and a substrate holder provided on an upper side of the tip end of the second arm, and configured to rotate around a vertical axis with respect to the second arm.

There is provided a substrate processing apparatus including: a light radiator configured to radiate a light for processing into an irradiation area which is smaller than a processing target area of a surface of a substrate; a driver configured to move the irradiation area in two directions that cross each other in a plane along the surface of the substrate; and a controller configured to control the driver to move an irradiation position in two directions according to a movement pattern which has been set to radiate the light to an entire area of the processing target area.

Substrate processing apparatus, substrate processing method, and storage medium

A substrate processing apparatus includes: first and second places in which a substrate can be placed; a substrate transfer device having a substrate holder that holds the substrate to transfer the substrate between the first and second places; and a substrate position measuring unit that detects a position of the substrate held by the substrate holder. The substrate position measuring unit, disposed independently of the substrate transfer device, is arranged at a position where the substrate held by the substrate holder of the substrate transfer device can be placed.

Substrate processing apparatus, method for correcting positional displacement, and storage medium

An apparatus includes: measurement flow passage portions as part of a respective plurality of supply paths of fluids to be supplied to a substrate, the measurement flow passage portions constituting measurement regions for measurement of foreign matter in the fluids, and being disposed so as to form a row with each other; a light irradiating unit configured to form an optical path in one of the flow passage portions, the light irradiating unit being shared by the plurality of flow passage portions; a moving mechanism configured to move the light irradiating unit relatively along a direction of arrangement of the flow passage portions to form the optical path within the flow passage portion selected among the plurality of flow passage portions; a light receiving unit including a light receiving element, the light receiving element receiving light transmitted by the flow passage portion; and a detecting unit configured to detect foreign matter in the fluid on a basis of a signal output from the light receiving element. Consequently, the number of necessary light irradiating units can be reduced, and the apparatus can be miniaturized.

A substrate holder positioning method, capable of positioning a substrate holder without using any positioning jig, includes: measuring a first position of a substrate held on a substrate holder included in a substrate carrying mechanism; carrying the substrate held on the substrate holder to a substrate rotating unit for holding and rotating the substrate; turning the substrate held by the substrate rotating unit through a predetermined angle by the substrate rotating unit; transferring the substrate turned by the substrate rotating unit from the substrate rotating unit to the substrate holder; measuring a second position of the substrate transferred from the substrate rotating unit to the substrate holder; determining the position of the center of rotation of the substrate rotating unit on the basis of the first and the second position; and positioning the substrate holder on the basis of the position of the center of rotation.

Thermal processing apparatus for thermal processing substrate and positioning method of positioning substrate transfer position

A substrate transfer device that transfers a substrate by allowing a substrate opening formed on a front surface of a substrate transfer vessel to face an opening formed on a partition wall from one side of the partition wall and separating a cover body of the substrate transfer vessel from the other side of the partition wall includes a door configured to open and close the opening from the other side of the partition wall; a reciprocating unit configured to straightly move the door back and forth between a first position where the opening is closed and a second position away from the first position toward the other side of the partition wall; and a rotating unit configured to rotate the door around a rotation axis in a straightly moving direction of the door between the second position and a third position deviated from a region facing the opening.

Substrate transfer device, substrate transfer method, and storage medium

A substrate treatment system comprise a treatment station having a plurality of treatment units provided at multiple tiers in an up-down direction, a cassette mounting table on which a cassette housing a plurality of wafers W is mounted, and a wafer transfer mechanism arranged between the treatment station and the cassette mounting table, wherein a delivery block in which a plurality of delivery units are provided at multiple tiers is provided between the treatment station and the wafer transfer mechanism, the delivery units temporarily housing a wafer to be transferred between the cassette mounting table and the treatment station and a wafer to be transferred between the tiers of the treatment units. The wafer transfer mechanism includes a first transfer arm that transfers a wafer between the cassette mounting table and the delivery block, and a second transfer arm that transfers a wafer between the tiers of the delivery units.

Substrate treatment system, substrate transfer method and non-transitory computer-readable storage medium

A substrate processing apparatus includes: a carrier block including first and second carrier placement units spaced apart in a right and left direction; a processing block having a layered structure in which a plurality of layered parts are vertically arranged, the layered parts each including a substrate transport mechanism for transporting a substrate and a processing module for processing a substrate; a tower unit including plural substrate placement units located at height positions where a substrate is transferred by the substrate transport mechanism of the layered part corresponding to the substrate placement unit; a first substrate transfer mechanism configured to transfer a substrate between the carrier on the first carrier placement unit and the substrate placement unit of the tower unit; and a second substrate transfer mechanism configured to transfer a substrate between the carrier on the second substrate placement unit and the substrate placement unit of the tower unit.

Substrate processing apparatus, substrate processing method and storage medium

Substrate holder positioning method and substrate processing system

Growing community of inventors

Koshi, Japan

Naruaki Iida