Other

Micron Technology Incorporated

Narahari Ramanuja

Ming Jin

Ilya V Karpov

Jinwook Lee

A small critical dimension element, such as a heater for an ovonic unified memory, may be formed within a pore by using successive sidewall spacers. The use of at least two successive spacers enables the limitations imposed by lithography and the limitations imposed by bread loafing be overcome to provide reduced critical dimension elements.

Fabricating sub-lithographic contacts

A small critical dimension element, such as a heater for an ovonic unified memory, may be formed within a pore by using successive sidewall spacers. The use of at least two successive spacers enables the limitations imposed by lithography and the limitations imposed by bread loafing to be overcome to provide reduced critical dimension elements.

Growing community of inventors

Fremont, CA, United States of America

Narahari Ramanuja