Mitsubishi Denki Kabushiki Kaisha

Naoyuki Shimada

Kenichi Ono

Kimio Shigihara

Kazushige Kawasaki

Yoshihiko Hanamaki

Kimitaka Shibata

A semiconductor optical element having a includes an n-type GaAs buffer layer, an n-type AlGaInP cladding layer, a first InGaAsP (including zero As content)guide layer without added dopant impurities, an InGaAsP (including zero In content) active layer, a second InGaAsP (including zero As content)guide layer without added dopant impurities, a p-type AlGaInP cladding layer, a p-type band discontinuity reduction layer, and a p-type GaAs contact layer sequentially laminated on an n-type GaAs substrate C or Mg is the dopant impurity in the p-type GaAs contact layer, the p-type band discontinuity reduction layer, and the p-type AlGaInP cladding layer.

Growing community of inventors

Tokyo, Japan

Naoyuki Shimada