Canon Anelva Corporation

Anelva Corporation

Naoyuki Nozawa

Yoshiro Hasegawa

Yukihito Tashiro

Kazuhito Watanabe

Daisuke Kobinata

Masahito Ishihara

Miho Sakai

Terushige Takeyama

Hiroshi Sone

Hideo Mano

Reiji Sakamoto

Satoshi Hitomi

Hidekazu Nishimura

Toshiaki Sasaki

Satoshi Nakamura

Kurita Takaki

Nobuo Matsuki

Itaru Hagiwara

A deposition apparatus includes a chamber, a holding unit configured to hold a substrate in the chamber, a driving unit configured to move the holding unit holding the substrate such that the substrate passes through a deposition area in the chamber, a deposition unit configured to form a film on the substrate passing through the deposition area by supplying a deposition material to the deposition area, and a cooling unit configured to cool the holding unit.

Deposition apparatus

A deposition apparatus comprises a source unit configured to generate a plasma by arc discharge, a deposition unit in which a deposition target material is arranged so as to be irradiated with the plasma generated in the source unit, and an induction unit configured to induce the plasma for the source unit to the deposition unit. The induction unit comprises a partition unit airtightly connected to each of the source unit and the deposition unit and configured to pass the plasma inside, and a plurality of magnet units configured to form a magnetic field to induce the plasma in the partition unit. The plurality of magnet units are connected to adjust a connection angle, and the partition unit includes a tubular member bendable according to the connection angle of the plurality of magnet units.

A substrate transport apparatus including a first substrate holder and a second substrate holder capable of respectively holding substrates includes a first drive arm which has first and second end portions, and is rotatable with rotation of a first drive shaft, a second drive arm which has a third end portion spaced apart from the first end portion by a first distance, and a fourth end portion spaced apart from the second end portion by a second distance, and is rotatable with rotation of a second drive shaft coaxial with the first drive shaft, two first driven arms coupled to the first substrate holder, and two second driven arms coupled to the second substrate holder.

Substrate transport apparatus, and system and method for manufacturing electronic device

A vacuum actuator includes a vacuum partition wall, the interior of which can be evacuated to a vacuum, a rotor supported by the vacuum partition wall to be free to rotate, a permanent magnet provided on the outer peripheral surface of the rotor, a coil opposed to the permanent magnet, and a stator provided with the coil. The stator and the vacuum partition wall are formed integrally with each other.

Vacuum actuator including a stator forming a part of a vacuum partition wall

A substrate transport apparatus comprises chambers connected to each other through a gate valve, a transport mechanism configured to open the gate valve and to transport a carrier between the chambers along a transport path, a sensor configured to detect the carrier before the carrier reaches a stop position in the chamber, and a controller configured to cause the gate valve to start closing based on the detection signal from the sensor.

Substrate transport apparatus and method for manufacturing magnetic recording medium

A transfer apparatus includes a first magnetic member placed in a carrier, and a second magnetic member placed in a carrier supporting unit to oppose the first magnetic member from a position below the first magnetic member in the vertical direction, and having the same polarity as that of the first magnetic member. The repulsive force generated between the first and second magnetic members vertically pushes up the carrier, thereby reducing the weight of the carrier supported by the carrier supporting unit.

Transfer apparatus

Substrate support mechanism and substrate rotation device

A substrate holder for holding a circular substrate in a vertical position during processing of the substrate. The substrate holder is provided with a vertical base plate and three support claws which are mounted on the base plate and which hold the peripheral edge of a substrate. One of the three support claws is a fixed support claw which holds the edge of the substrate at the bottom to support and whose position does not change when the weight of the substrate is supported. The other two support claws are moveable and may be actuated to hold the edge of the substrate at its sides to restrain motion of the substrate. The moveable support claws can be opened and closed for substrate mounting and removal. The two movable support claws are installed on the base plate in a manner so that when the substrate is supported by the fixed support claw they contact the side edge at locations which are higher than the height of the center of the substrate.

Substrate holder

A substrate holder to support a substrate in a vertical position in a substrate processing device that performs a process on the substrate, where the process involves forming a plasma in the space around the substrate. The substrate holder includes a base plate and a plurality of supporting claws that are attached to the base plate and arranged so as to come into contact with the outer edge of the substrate and provide vertical support for the substrate. At least one of the plurality of supporting claws is a movable supporting claw that can be brought into contact with and separated from the outer edge of the substrate. When a substrate has been loaded into the holder, the space around the substrate is substantially filled by the base plate or by a member attached to the base plate. The gap formed around the periphery of the substrate between the substrate and base plate is narrower at locations in the circumferential direction to the front and rear of the supporting claws, compared to that at other positions in the circumferential direction along the periphery of the substrate.

Growing community of inventors

Inagi, Japan

Naoyuki Nozawa