Fujifilm Corporation

Naoya Iguchi

Tsukasa Yamanaka

Ryosuke Ueba

Michihiro Shirakawa

Keita Kato

Kei Yamamoto

Naohiro Tango

Takashi Kawamoto

Provided are a method for inspecting a photosensitive composition, the method being able to more accurately evaluate photosensitive compositions produced at different times and including the same materials, and a method for producing a photosensitive composition. The method for inspecting a photosensitive composition includes a first step of performing exposure treatment, heat treatment, and development treatment in this order on a dummy substrate including a first photosensitive composition layer formed using a first photosensitive composition; a second step of performing exposure treatment, heat treatment, and development treatment under the same conditions as in the first step on a first evaluation substrate including the first photosensitive composition layer to form a pattern; a third step of performing exposure treatment, heat treatment, and development treatment under the same conditions as in the first step on a second evaluation substrate including a second photosensitive composition layer formed using a second photosensitive composition to form a pattern; and a fourth step of determining whether a difference between a dimension of the pattern obtained in the second step and a dimension of the pattern obtained in the third step is within an acceptable range. The first photosensitive composition and the second photosensitive composition are compositions including the same materials and produced in different lots.

Method for inspecting photosensitive composition and method for producing photosensitive composition

There is disclosed a method for manufacturing an organic processing fluid for patterning of a chemical amplification type resist film, comprising a step of causing a fluid containing an organic solvent to pass through a filtration device having a fluid input portion, a fluid output portion, and a filtration filter film provided in a flow path that connects the fluid input portion and the fluid output portion with each other, wherein an absolute value (|T&#x2212;T|) of a difference between a temperature (T) of the fluid in the fluid input portion and a temperature (T) of the fluid in the fluid output portion is 3&#xb0; C. or lower, a filtration speed of the fluid in the filtration device is 0.5 L/min/mor greater, and a filtration pressure by the fluid in the filtration device is 0.10 MPa or lower.

Method for manufacturing organic processing fluid for patterning of chemical amplification type resist film, organic processing fluid for patterning of chemical amplification type resist film, pattern forming method, method for manufacturing electronic device, and electronic device

A pattern forming method includes: (a) forming a first film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition (I) containing a resin of which solubility in a developer containing an organic solvent decreases due to polarity increased by an action of an acid; (b) exposing the first film; (c) developing the exposed first film using a developer containing an organic solvent to form a first negative pattern; (e) forming a second film on the substrate using an actinic ray-sensitive or radiation-sensitive resin composition (II) containing a resin of which solubility in a developer containing an organic solvent decreases due to polarity increased by an action of an acid; (f) exposing the second film; and (g) developing the exposed second film using a developer containing an organic solvent to form a second negative pattern in this order.

Pattern forming method, and, electronic device producing method and electronic device, each using the same

A pattern formation method includes step (i) of forming a first negative type pattern on a substrate by performing step (i-) of forming a first film on the substrate using an actinic ray-sensitive or radiation-sensitive resin composition, step (i-) of exposing the first film and step (i-) of developing the exposed first film in this order; step (iii) of forming a second film at least on the first negative type pattern using an actinic ray-sensitive or radiation-sensitive resin composition (); step (v) of exposing the second film; and step (vi) of developing the exposed second film and forming a second negative type pattern at least on the first negative type pattern.

Growing community of inventors

Haibara-gun, Japan

Naoya Iguchi