Ricoh Company, Ltd.

Ebara Corporation

Hitachi-Kokusai Electric Inc.

Canon Kabushiki Kaisha

Fujifilm Corporation

Satake Corporation

Naoto Takahashi

Mizuki Nagai

Naoya Fujimoto

Yoshiyuki Oshida

Shinichi Nakai

Shigekazu Tsuji

Mitsuhiro Shamoto

Manabu Nakamura

Atsushi Takagi

Norikazu Kato

Ryosuke Miura

Naoki Shimomura

Nobuyoshi Ikeda

Sunao Egashira

Haruyoshi Yamaguchi

Hiroshi Sakuyama

Hiroyuki Asanuma

There is provided an apparatus for plating a substrate, comprising: an anode placed to be opposed to the substrate; and an intermediate mask placed between the substrate and the anode to be arranged on a substrate side, provided with a first center opening that causes an electric field from the anode toward the substrate to pass through, and further provided with an auxiliary anode that is placed in an internal space of the intermediate mask to be arranged around the first center opening, wherein the auxiliary anode has an area that is not greater than ⅕ of an area of the anode.

Apparatus for plating and method of plating

In the cell culture device, a volume of a space defined by a diaphragm of the diaphragm pump and a plane at an outer edge of the diaphragm is 1 cmor more and 20 cmor less, in a case where an angle formed by a straight line connecting a foot of a perpendicular line from the apex to the plane to each point in the diaphragm and by the perpendicular line is denoted by an angle A, a thickness H of the diaphragm is within a range of 0.5 mm or more and 1.5 mm or less where the angle A is from 0° to 75°, and in a case where a thickness of the diaphragm at the apex is denoted by H, the thickness H satisfies a relationship of 1≤H/H≤1.75 at any point where the angle A is from 0° to 75°.

Cell culture device, method for culturing cells, and method for producing product

A radiation imaging apparatus that is able to perform radiography using a grid in which a radiation transmissive layer and a radiation absorption layer each having a strip shape and extending in a first direction are alternately arranged in a second direction, the radiation imaging apparatus includes a pixel unit including a plurality of imaging pixels and a plurality of detection pixels, wherein the plurality of detection pixels includes a first detection pixel and a second detection pixel that are in a pair in the second direction, an output signal value of the first detection pixel is larger than an average value of output signal values of the plurality of imaging pixels and the plurality of detection pixels, and an output signal value of the second detection pixel is smaller than the average value.

Radiation imaging apparatus

There is provided a terminal device for displaying status information of a plurality of RF generators. On a display screen, numerical values of a specific item of the status information are displayed as figures having different lengths, and values of another item different from the specific item are displayed in at least one of color tones, patterns, or shapes of the figures, and when the specific item is a frequency and the another item is a phase, output powers of the plurality of RF generators are displayed as figures of bar graphs over the frequency, and phases of the RF generators are displayed in at least one of color tones, patterns, or shapes of the corresponding figures.

Terminal device and RF power supply device

An image processing apparatus removes a pattern caused by a grid from a radiation image captured by using a scattered ray removal grid. The image processing apparatus includes a grid pattern removal unit, a filtering unit, and a distortion correction unit. The grid pattern removal unit is configured to generate a grid pattern removal image by removing a grid pattern from the radiation image. The filtering unit is configured to extract a frequency component lower than a frequency of the grid pattern from the radiation image. The distortion correction unit is configured to replace a low-frequency component included in the grid pattern removal image with a frequency component obtained by the filtering unit.

Image processing apparatus, image processing method, and storage medium

A radio frequency (RF) generator device for supplying RF powers of different frequencies to multiple antennas disposed in a chamber is provided. The RF generator device includes a plurality of RF generators configured to supply the RF powers of the different frequencies to the multiple antennas, and a plurality of RF controllers configured to control the RF generators, respectively. Each of the RF controllers includes a fast Fourier transformer, and a filter. The fast Fourier transformer performs fast Fourier transform on a signal introduced as a reflected wave to decompose the signal into frequency components, and the filter removes waves having frequency components that are not outputted from the corresponding RF generator.

RF generator device and substrate processing apparatus

A method for producing a product related to the specified technology includes adjusting the concentration of cells in a culture vessel to a value of from 3&#xd7;10cells/ml to 3&#xd7;10cells/ml; in a case in which the average diameter of single cells in the culture vessel is designated as A, adjusting the number proportion of cells having a single cell diameter of 1.4&#xd7;A or greater in the culture vessel to 5% or less, and adjusting the number proportion of cells having a single cell diameter in the range of A&#xb1;A/7 to 50% or more.

Method for producing product

There is provided an apparatus for plating a substrate as an object to be plated. The apparatus comprises an anode and a thief tunnel arranged to be located between the substrate and the anode when the substrate is placed to be opposed to the anode. The thief tunnel comprises a body placed away from the substrate and provided with an opening; a plurality of auxiliary electrodes provided in or to the body; and an ion exchange membrane configured to protect the auxiliary electrodes from a plating solution. The plurality of auxiliary electrodes are arranged along a circumference of the opening. At least one of the auxiliary electrodes is configured such that a voltage to be applied to the at least one of the auxiliary electrodes is controlled independently of a voltage to be applied to one or more auxiliary electrodes other than the at least one of the auxiliary electrodes.

Apparatus for plating

There is provided a method of plating, comprising: a process of providing a substrate that includes a first face and a second face having different patterns; a plating process of respectively supplying electric current of a first plating current density and electric current of a second plating current density to the first face and to the second face of the substrate, so as to form a plating film on the first face and a plating film on the second face; and a process of, after plating is completed first either on the first face or on the second face, supplying protection current to the face where plating is completed first, wherein the protection current has a smaller current density than the first plating current density or the second plating current density of the electric current supplied to the face where plating is completed first during plating.

Method of plating, apparatus for plating, and non-volatile storage medium that stores program

To optimize a location of a power feeding point with the use of a square substrate. There is disclosed a method for determining a location of a power feeding point in an electroplating apparatus. The electroplating apparatus is configured to plate a rectangular substrate having a substrate area of S. The rectangular substrate has opposed two sides coupled to a power supply. The rectangular substrate has a length L of the sides coupled to the power supply and a length W of sides not coupled to the power supply meeting a condition of 0.8&#xd7;L&#x2264;W&#x2264;L. The method includes determining a number N of the power feeding points according to the substrate area S.

Method for determining location of power feeding point in electroplating apparatus and electroplating apparatus for plating rectangular substrate

The disclosure improves a position confirmation method for members in a plating tank. A plating apparatus for applying a plating process on a substrate is provided. The plating apparatus includes a plating tank, a first member disposed in the plating tank, a second member disposed opposite to the first member in the plating tank, an optical sensor disposed on one of the first and second members, and a plurality of detected parts disposed on the other of the first and second members to be detectable by the optical sensor.

Plating apparatus and recording medium recording program thereon

A matching unit includes a directional coupler for detecting a travelling wave and a reflected wave; a matching circuit including a first variable capacitance capacitor, a second variable capacitance capacitor and an inductance; and a control unit for controlling VCand VCof the first and the second variable capacitance capacitor by calculating a reflection coefficient based on the travelling wave and the reflected wave. When a distance between the calculated reflection coefficient and a circle described by a trace of the reflection coefficient which passes through a matching point on a Smith chart is greater than a predetermined value, the control unit changes VCof the second variable capacitance capacitor and the calculated reflection coefficient to make the distance within the predetermined value. When the distance becomes within the predetermined value, the control unit changes VCof the first variable capacitance capacitor and makes the calculated reflection coefficient smaller.

Matching unit and matching method

A device, method, and program stored in a recording medium are provided. A sampling time period and, a value of limit angle are set. Inclination of the projector device is detected with respect to a horizontal surface to output a plurality of inclination angle values of the projector device. A representative angle value of a current sampling time period is calculated based on the plurality of inclination angle values and the difference between the representative angle value and a representative angle value from a previous sampling time period is calculated. It is determined whether the difference in representative angle value is equal to or greater than the limit angle value to generate a determination result. Finally, trapezoidal distortion in the image is corrected based on the inclination angle values detected when the determination result indicates that the difference is equal to or greater than the limit angle value.

Projector device, distortion correction method, and recording medium storing distortion correction program

In a network synchronization system, setting information synchronized among plural information processing apparatuses contains at least user information; user operating policy information; first equipment group information that prescribes a first equipment group to which the information processing apparatus belongs; and equipment operating policy information. The information processing apparatus includes a user authentication unit; a storage unit that stores the setting information and second equipment group information that prescribes a second equipment group to which the information processing apparatus belongs; and an operating policy generation unit that generates an applied operating policy to be applied to a login user. The operating policy generation unit generates, when the second equipment group information is contained in the first equipment group information, the applied operating policy in accordance with the equipment operating policy information corresponding to the first equipment group information in preference to the user operating policy information corresponding to authenticated user information.

Growing community of inventors

Tokyo, Japan

Naoto Takahashi