Kokusai Electric Co., Ltd.

Sony Group Corporation

The Furukawa Electric Co., Ltd.

Kyoto University

Astellas Pharma Gmbh

Ricoh Company, Ltd.

Naoto Nakamura

Hiroyuki Satoh

Ichiro Sakamoto

Kiyohiko Maeda

Takashi Shimahara

Hironori Suzuki

Masahiko Akamatsu

Hironori Harada

Hisao Hamaguchi

Shuh Narumiya

Takayoshi Hirai

Yukio Kozaki

Shimon Sakaguchi

Koretaka Ogata

Kanta Shimizu

Nobuhiko Hattori

Naganari Ohkura

Norihisa Mikami

Guliang Xia

Satoru Ujihara

Yohei Ebihara

A surgery support system according to the present disclosure includes an analysis unit that generates risk analysis information from a first surgery image acquired by an acquiring unit, by adopting the first surgery image to a trained model generated using learning data including a second surgery image that is a surgery image different from the first surgery image, the second surgery image having associated information on a complication risk due to surgery, and an output unit that outputs surgery support information that is based on the risk analysis information generated by the analysis unit, in a superimposed manner on the first surgery image.

Surgery support system, surgery support method, information processing apparatus, and information processing program

The present technique relates to a telemedicine system, a telemedicine method, an information processing device, and a program that allow a medical practitioner to more accurately obtain visual information on a patient in telemedicine. The telemedicine system includes a first imaging unit that images a patient in a first space, an image processing unit that corrects an image of the patient based on imaging conditions in a first space and display conditions in a second space for displaying the image of the patient imaged in the first space, and a display unit that displays the corrected image of the patient in the second space. The present technique can be applied to, for example, a telemedicine system.

Telemedicine system, telemedicine method, information processing device, and program

Provided are a novel compound having CDK8 and/or CDK19 inhibitory activity, and a production method for Tregs. The treatment of T cells with a CDK8 and/or CDK19 inhibitor induces Foxp3 in the T cells. Foxp3T cells can be induced by treating Foxp3T cells with the CDK8 and/or CDK19 inhibitor in vitro. Thus, Tregs can be induced.

Compound, and method for producing regulatory T cells

[Problem] This invention aims at solving the problem of how a subscriber premises-side optical network unit can be switched to an evaluation mode without the use of a jig board. [Means for Solving the Problem] The invention refers to a subscriber premises-side optical network unit (ONU) which is connected to a center-side optical network unit (OLT) via an optical transmission line (optical fiber) and to an external device (switch) via an electric signal line (electric signal line); comprising a memory (memory switch) the stored content of which can be directly or indirectly rewritten by the external device; a detection part (CPU) for detecting that the content of the memory has been rewritten; and a control part (CPU) for performing, when the detection part detects that the stored content of the memory has been rewritten, a control whereby the optical sending part which sends optical signals to the optical transmission line is put into a continuous light emission state.

Subscriber premises-side optical network unit

Substrate processing apparatus and method, by which an outside air and a gas-phase backward flow are restrained from entering the inside of a reaction chamber during the inside of a reaction chamber is opened to the outside through a substrate carrying-in/carrying-out opening. This substrate processing apparatus, for example, a vertical CVD apparatus ( ) has a gas supply system ( ) and a bypass line ( ). The gas supply system ( ) supplies an inert gas to a space ( ) between an outer tube ( A) and an inner tube ( A) of a reaction furnace ( ) in a boat loading term and a boat unloading term. The bypass line ( ) exhausts an atmosphere from a reaction chamber ( ) by performing a slow exhaust operation in the boat loading term and the boat unloading term.

Substrate processing apparatus and method

A substrate processing apparatus and method restrains outside air and gas-phase backward flow from entering the inside of a reaction chamber during a time period that the inside of the reaction chamber is opened to the outside through a substrate carrying-in/carrying-out opening. The substrate processing apparatus can comprise, for example, a vertical CVD apparatus having a gas supply system and a bypass line. The gas supply system supplies inert gas to a space between an outer tube and an inner tube of a reaction furnace during a boat loading period and a boat unloading period. The bypass line exhausts the atmosphere from the reaction chamber by a slow exhaust operation during the boat loading period and the boat unloading period.

A semiconductor manufacturing apparatus including a heating device; a reaction tube disposed within the heating device, the reaction tube having a gas inlet portion and an exhaust portion parted from each other by a predetermined distance in the longitudinal direction of the reaction tube; and a plurality of gas feed pipes extending along a side wall of the reaction tube from the exhaust portion side to the gas inlet portion, the plurality of gas feed pipes being parted from each other. The reaction gas is provided through the plurality of gas feed pipes into the reaction tube, thereby providing an improved uniform temperature distribution within the reaction tube and resulting in an improved uniform film thickness of the oxide film formed on the surface of the semiconductor wafer.

Semiconductor manufacturing apparatus

Growing community of inventors

Tokyo, Japan

Naoto Nakamura