Kabushiki Kaisha Topcon

Naoto Miki

Hisashi Isozaki

Fumio Ohtomo

Hiroshi Yoshikawa

Jun-ichi Kodaira

Masahiro Ohishi

Akihiko Sekine

Hisakazu Yoshino

Isao Minegishi

Yoichiro Iwa

Naohiro Takahashi

Yuichi Yoshimura

Michihiro Yamazaki

Hiroyuki Maekawa

Noriyasu Kiryu

Hiroaki Soma

Jun-Ichi Kodaira

A surveying instrument which comprises a rotation unitadapted to direct a distance measuring optical axis to an object to be measured and the rotary drive unitrotates the rotation unit, comprising a rotary motor for rotating an output shaftand a clutch unit for connecting or disconnecting the rotary motor and the output shaft, wherein the rotary motor and the clutch unit are arranged in a series along the output shaft, and the output shaft is fixed to the rotation unit.

Rotary drive unit of a surveying instrument and a surveying instrument

A distance measuring device measures a distance from a phase difference of beaten down processing signals even when fluctuations occur in a frequency of an oscillator. The distance measuring device includes a laser unit, a dividing device, a reference light receiving unit, and a measuring light receiving unit. The distance measuring device further includes an oscillator, a first mixer, a second mixer, a fourth filter, a fifth filter, a third mixer, a sixth filter, a second filter, a phase difference measuring unit, and a distance measuring unit. The phase difference measuring unit measures a phase difference of the two beat signals extracted by the sixth filter and the second filter. The distance measuring unit measures a distance based on the phase difference measured by the phase difference measuring unit.

Distance measuring device

The present invention provides a distance measuring device, which comprises a light projecting unit for projecting a distance measuring light () to an object to be measured, a reference reflection unit () provided relatively movable and arranged at a known position so as to traverse the projected distance measuring light, a photodetection unit () for receiving a reflection light from the object to be measured as a reflected distance measuring light (') and a reflection light from said reference reflection unit as an internal reference light (&#x2033;), and a control arithmetic unit () for calculating a distance to the object to be measured based on a photodetection signal relating to the reflected distance measuring light and based on a photodetection signal relating to the internal reference light.

An alignment method of micro-alignment members includes a first step for moving a reticle, which is movably disposed between a first position and a second position, to face a first microscope in the first position, and for aligning a center of the reticle with an optical axis of the first microscope while observing the reticle by the first microscope, a second step for moving the reticle to the second position to face a second microscope in the second position, and for aligning the center of the reticle with an optical axis of the second microscope while observing the reticle by the second microscope, a third step for disposing a first micro-alignment member such that a center of the first micro-alignment member aligns with the optical axis of the second microscope, and a fourth step for disposing a second micro-alignment member instead of the reticle to face the first micro-alignment member.

Alignment method of micro-alignment members and device thereof

A surface inspection method in a surface inspection system which comprises a photodetection unit and a photodetection polarizing angle changing means, comprising the step of receiving a scattered reflection light from a substrate surface where standard particles are coated by changing a photodetection polarizing angle by the photodetection polarizing angle changing means, and the step of performing surface inspection by setting the photodetection polarizing angle to a condition where an S/N ratio of photodetection output is at the highest.

Surface inspection method and surface inspection system

A wafer surface inspection apparatus comprises a light source, an optical system for focusing the light beams from the light source onto the wafer surface, a scanning means for scanning the focused point over a predetermined range on the wafer surface, a photo detector including an photoelectric converter for sensing scattered light from the focused point, and a signal detector for detecting signals from the photo detector, in which the light source is a light source for emitting two different wavelengths, the optical system is adapted to focus the light beams of the two wavelengths on one and the same point on the wafer surface, and the photo detector is adapted to sense the two wavelengths separately, and further comprises a discriminating portion for discriminating between a foreign matter or a scratch on the wafer surface and a recess in a spot form existing on the wafer surface by utilizing outputs from the signal detector.

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Tokyo-to, Japan

Naoto Miki