Nec Corporation

Pioneer Corporation

Panasonic Corporation

Naoto Hirano

Nobumitsu Aibara

Tadashi Nakamura

Yoshito Tanaka

Kenichi Hayashi

Atsushi Yamamoto

Keiji Nunomura

Hitoshi Shiraishi

Hirokazu Tateno

Hiroshi Hasegawa

Yoshio Sano

Toshiyuki Akiyama

Yoshiaki Yanai

Kazuaki Yanagida

Tetsumasa Okamoto

Kazushige Takechi

Hajime Homma

Nobuya Seko

Kota Araki

Kouta Araki

Ribs for defining pixel cells are formed in the shape of a lattice, and sustain electrodes and scan electrodes are disposed near the ribs. The electrodes are spaced apart in each pixel cell, and the sustain electrode and the scan electrode are each cut away between pixel cells arranged in the row direction to provide each pixel cell with individually separated electrodes. In addition, between pixel cells adjacent to each other in the row direction, the sustain electrodes and the scan electrodes are connected to each other by means of a sustain-side bus electrode and a scan-side bus electrode, respectively. This makes it possible to provide a high luminous efficiency. Furthermore, each pixel cell is provided with a wide distance between the electrodes and thereby with a large effective opening portion. Thus, this provides only a small amount of reduction in intensity when the electrodes are spaced apart between the pixel cells arranged in the row direction in order to increase the luminous efficiency. The sustain electrodes or the scan electrodes can be connected to each other or shared between pixel cells adjacent to each other in the column direction and thus the effective opening portion can be made larger, thereby making it possible to provide a further increased intensity and luminous efficiency.

Plasma display panel and method for fabricating the same

A method for forming a pattern of a stacked film, includes steps (a) to (e). The step (a) is forming sequentially a first base insulating film and a light shielding material on a transparent substrate. The step (b) is patterning the light shielding material to obtain a light shielding film with a first pattern. The step (c) is forming sequentially a second base insulating film, a semiconductor film and a first oxide film on a substrate. The step (d) is forming a resist pattern with a second pattern on the first oxide film. The step (e) is forming a pattern of a stacked film by dry etching the first oxide film and the semiconductor film, above the light shielding film. The stacked film includes the semiconductor film and the first oxide film. The dry etching includes an etching by using an etching gas and the resist pattern as a mask. The semiconductor film includes a taper angle which is controlled to be within predetermined range.

Stacked film including a semiconductor film having a taper angle, and thin film transistor including the stacked film

A semiconductor film serving as an active region of a thin film transistor and an upper oxide film protecting the semiconductor film are dry etched to form the active region. In this case, a fluorine-based gas is used as the etching gas, and the etching gas is switched from the fluorine-based gas to a chlorine-based gas at a point of time when a lower oxide film as an underlying film of the semiconductor film is exposed. As the fluorine-based gas, a mixed gas of CFand Ois used, and suitably, a gas ratio of CFand Oin the mixture gas is set at 1:1, and the dry etching is performed therefor. By this etching, a side face of a two-layer structure of the semiconductor film and upper oxide film is optimally tapered, and a crack or a disconnection is prevented from being occurring in a film crossing over the two-layer structure.

Method for forming pattern of stacked film

Method for forming pattern of stacked film and thin film transistor

Ribs for defining pixel cells are formed in the shape of a lattice, and sustain electrodes and scan electrodes are disposed near the ribs. The electrodes are spaced apart in each pixel cell, and the sustain electrode and the scan electrode are each cut away between pixel cells arranged in the row direction to provide each pixel cell with individually separated electrodes. In addition, between pixel cells adjacent to each other in the row direction, the sustain electrodes and the scan electrodes are connected to each other by means of a sustain-side bus electrode and a scan-side bus electrode, respectively. This makes it possible to provide a high luminous efficiency.

The PDP disclosed herein has a plurality of thin wire electrodes extending in the row direction, which are laid out in such a way as to widen the interval at a fixed ratio (2 times) from the discharge gap section toward the non-discharge gap section as well as to shorten the lengths of those row direction thin wire electrodes in steps with a fixed difference (approximately 20 &mgr;m&times;left/right) from the cell's vertical center axis toward the partition walls. They are connected by thin wire electrodes that extend in the column direction to form antenna-shaped plane electrodes and the thin wire electrodes that extend in the column direction from the center of the antenna-shaped plane electrodes and the bus electrodes that extend in the row direction are connected to form a sustaining electrode pair (scan electrode and common electrode).

Plasma display panel having an improved plane electrode structure

A plasma display panel is provided with a transparent substrate, and scanning electrodes and sustaining electrodes formed on the transparent substrate extending in a first direction. An area of the scanning electrode is smaller than an area of the sustaining electrode in each of display cells. The widths of the scanning electrode and the sustaining electrode in a second direction crossing the first direction are substantially equal to each other.

Plasma display panel

A plasma display panel has an improved cell electrode structure including: a pair of sustaining and scanning electrodes which are approximately similar or equal in area to each other, and which are different from each other in pattern shape. Each of the scanning electrode alignments further includes a plurality of scanning electrodes. Adjacent two of the scanning electrodes are separated from each other by the separation wall. Each of the sustaining electrode alignments further includes a plurality of sustaining electrodes. Adjacent two of the sustaining electrodes are separated from each other by the separation wall.

Plasma display panel with an improved electrode structure

Disclosed is a plasma display apparatus comprising: discharge spaces of red which emit lights of red; discharge spaces of green which emit lights of green; discharge spaces of blue which emit lights of blue; and photo masks which are formed and arranged in order that an aperture of each of the discharge spaces of red may be wider than an aperture of each of the discharge spaces of green in area and an aperture of each of the discharge spaces of blue may be wider than the aperture of each of the discharge spaces of red in area.

Plasma display apparatus with photo mask apertures

To provide a plasma display panel which improves the write characteristics, luminous luminance, and luminous efficiency and which has a longer life. On a back glass substrate, data electrodes are formed in the substrate column direction. Over the data electrodes, a dielectric layer is formed. On the dielectric layer, scan electrodes are formed in a substrate row direction. Over the scan electrodes, a dielectric layer is formed. On the dielectric layer, partitions are formed in the substrate column direction. On the dielectric layer including the partitions, a protection layer and a fluorescent material layer are formed. On the other hand, on a front glass substrate, common electrodes and bus electrodes electrically connected to the common electrodes are formed in the substrate row direction so as to be opposed to the scan electrodes. Over the common electrodes and the bus electrodes, a dielectric layer and a protection layer are formed.

Apparatus, manufacturing method and driving method of plasma display panel

This invention provides an inverted staggered type thin-film transistor element wherein the n-doped amorphous silicon film ( ) present in the region where the amorphous silicon film ( ) does not overlap with the source-drain electrodes ( ) is modified into an insulating film ( ) by exposure to a plasma containing ions or radicals of oxygen and/or nitrogen, so that the undesired n-doped amorphous silicon film above a channel region need not be removed and the amorphous silicon film can be made thinner. Moreover, the aperture ratio of a liquid crystal display can be enhanced by utilizing such elements.

Thin-film transistor elements and methods of making same

Each cell of a PDP is provided with a pair of narrow and substantially U-shaped plane electrodes, which are connected to a corresponding trace electrode at the open ends thereof (located at the respective non-discharging gap sides) to operate as scan electrode and common electrode. A plane discharging gap is defined between the closed front ends of the plane electrodes. The plane electrodes have a curved profile at the front ends thereof with the highest point located at the longitudinal central axis of the cell. With this arrangement, the effective length of the plane electrodes can be increased without increasing the surface area of the plane electrodes so that the plane electrodes overlap the data electrode at the front ends thereof over an expanded area.

Growing community of inventors

Tokyo, Japan

Naoto Hirano