The Furukawa Electric Co., Ltd.

National Institute of Advanced Industrial Science and Technology

Naoto Edo

Toshiya Kumagai

Masakazu Matsui

Takaaki Manabe

Norio Matsui

Kengo Nakao

Mitsugu Sohma

Hajime Kasahara

An oxide superconducting thin film includes a substrate, and an intermediate layer and a superconducting layer provided in this order on the substrate. The intermediate layer has an average thickness of from 10 nm to 20 nm and a surface roughness Ra of 0.5 nm or less. The superconducting layer is formed on a surface of the intermediate layer and includes an oxide superconductor as a main component. A superconducting fault current limiter including the oxide superconducting thin film is also provided.

Oxide superconductor thin film and superconducting fault current limiter

An oxide superconducting thin film includes a substrate having a single crystal structure, the main face of the substrate and a crystal face of the single crystal structure having an angle therebetween; an intermediate layer formed on the main face of the substrate and having an axis oriented in a direction perpendicular to the crystal face; and a superconducting layer formed on the intermediate layer and containing, as a main component, an oxide superconductor having a c-axis oriented in a direction perpendicular to the surface of the intermediate layer. A superconducting fault current limiter and a method of manufacturing an oxide superconducting thin film are also provided.

Oxide superconductor thin film, superconducting fault current limiter, and method for manufacturing oxide superconductor thin film

Growing community of inventors

Tokyo, Japan

Naoto Edo