Konishiroku Photo Industry Co., Ltd.

Naoto Abe

Masaru Kanbe

Masayoshi Mayama

Masao Ishihara

Takahiro Uozumi

Kenichi Kitahara

Hideyasu Ohta

Jun Shirasaki

Hiroyuki Nomori

Toyoaki Masukawa

Mitsuto Fujiwhara

Eiichi Sakamoto

Tsuneo Wada

Syunji Matsuo

Toshiaki Shibue

Koichi Nagayasu

Sadatugu Terada

Takanori Nakadate

Hiroshi Yamada

Keiji Oishi

Akio Iijima

Mamoru Komiya

Kazuo Nakazato

Hironobu Nakao

Hidetoshi Akimoto

A coating layer, such as a photosensitive selenium coating is removed from a substrate by producing cracks in the layer, introducing a volume expansive material into the cracks, and then causing the volume expansive material introduced into the cracks to expand and thereby dislodge the coating layer from the substrate.

Method for removing a selenium layer from a substrate

In the process for preparing impregnated polymer latex compositions by impregnating a hydrophobic substance in dispersed polymer particles in an aqueous polymer latex, the improvement comprises impregnating said hydrophobic substance, wherein the impregnation is effected by mixing said hydrophobic substance which is solid state, a water-miscible organic solvent and aqueous polymer latex wherein a polymer of the polymer latex is prepared from ethene monomers and containing at least one hydrophilic group.

Process for preparing impregnated polymer latex compositions

A photographic polyester support having an adjacent subbing layer which comprises a copolymer of (1) glycidyl acrylate and/or glycidyl methacrylate and (2) hydroxylalkyl acrylate with the alkyl groups of 2-4 carbon atoms and/or hydroxyalkyl methacrylate wherein 0-67 wt % of a copolymerizable vinyl monomer may be present and the method of subbing said support with an aqueous composition of the acrylate copolymer.

Photographic polyester supports subjected to subbing treatment

A photographic film which comprises (A) a support, having two sides, (B) at least one light-sensitive emulsion layer on one side of said support (A), and, (C) at least one layer containing a compound represented by formula [I]and a hydrophobic polymer (first layer) and at least one layer containing an antistatic agent (second layer), said first and second layers being placed on the other side of said support (A) and said first layer being placed closer to said support (A) than said second layer: ##STR1## wherein, R.sub.1 represents a carboxylic acid residue having from 12 to 24 carbon atoms and R.sub.2, R.sub.3 and R.sub.4 represent independently hydrogen atoms or organic acid residues having from 1 to 24 carbon atoms.

Photographic films

A method of undercoating a polyester film of a light sensitive photographic material is disclosed in which one side of the film is pretreated such that the contact angle with water is below 58.degree.. Additionally, a layer of an aqueous dispersion containing no organic solvent is applied to said side of said film, said dispersion containing a copolymer containing up to 60% by weight of glycidyl methacrylate and 25-60% by weight of ethyl acrylate.

Method of undercoating treatment of polyester films for photographic

A photographic light-sensitive material comprising a layer which contains a compound represented by the following Formula I ##STR1## wherein R.sub.1 is an alkyl group having 1 to 18 carbon atoms, R.sub.2 is a hydrogen atom or an alkyl group having 1 to 18 carbon atoms with a proviso that when R.sub.2 is a hydrogen atom, R.sub.1 is an alkyl group having 1 to 7 carbon atoms, M is a cation and n is a number of 1 to 50.

Photographic light-sensitive material

The present application is directed to a process for subbing a photographic hydrophobic film which involves subjecting at least one surface of the film to a hydrophylizing pretreatment step, coating the pretreated surface with an aqueous dispersion containing a polymer which has particular comonomers in a combined amount of more than 76%, then coating the coated surface with a liquid containing colloidal silica.

Process for subbing photographic hydrophobic films

Growing community of inventors

Hino, Japan

Naoto Abe