Merck Patent Gmbh

Naotaka Nakadan

Toshiya Okamura

Naoko Nakamoto

Rikio Kozaki

Bertram Barnickel

To provide a siloxazane compound capable of shortening the time of a siliceous film producing process and a composition comprising the same. A siloxazane compound having a specific structure, wherein the ratio of the number of O atoms to the total number of O atoms and N atoms is 5% or more and 25% or less, and in the spectrum of the siloxazane compound obtained bySi-NMR in accordance with the inverse gate decoupling method, the ratio of the area of the peak detected in &#x2212;75 ppm to &#x2212;90 ppm is 4.0% or less to the area of the peak detected in &#x2212;25 ppm to &#x2212;55 ppm; and a composition comprising the same.

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Kakegawa, Japan

Naotaka Nakadan