Nitto-Denko Corporation

Naotaka Kinjou

Amane Mochizuki

Takashi Shimizu

Masayuki Satake

Yusuke Shimizu

Takahiro Fukuoka

Yuusuke Toyama

Kazunori Mune

Mitsuhiro Kanada

Kentarou Yoshida

A liquid crystal panel has a first optical film () adhered to a viewing side of a liquid crystal cell () through a first pressure-sensitive adhesive layer (), and a second optical film () adhered to the reverse side of the liquid crystal cell () through a second pressure-sensitive adhesive layer (). A creep value (L1) of the first pressure-sensitive adhesive layer () is from 50 to 3000 &#x3bc;m. A creep value (L2) of the second pressure-sensitive adhesive layer () is from 10 to 400 &#x3bc;m. The creep value (L1) of the first pressure-sensitive adhesive layer () is larger than the creep value (L2) of the second pressure-sensitive adhesive layer (). The creep value means the shift amount after one hour of the pressure-sensitive adhesive layer having a thickness of 20 &#x3bc;m in a case where a tensile shearing force of 4.9 N is applied to an adhesive area of 10 mmat 23&#xb0; C.

Liquid crystal panel and liquid crystal display apparatus

An optical waveguide and a production method thereof that can provide increased production efficiency, improved workability, and/or production stability. According to non-limiting example embodiments a photopolymerizable resin composition comprising a fluorene derivative and a photoacid generator is coated over an under clad layer and then is dried, to form a resin layer having substantially no surface tack. The resin layer is exposed to light in the state of being contacted with a photo mask by a contact exposure method and then is developed, to form the resin layer into a pattern. Thereafter, the resin layer is cured to form a core layer and then an over clad layer is formed on the under clad layer in such a manner as to cover the core layer, to thereby produce an optical waveguide.

Optical waveguide and production method thereof

A method of producing porous polyimide resin that enables pores to be formed in a precursor of polyimide resin, with its form of microphase-separated structure wherein a dispersive compound is dispersed in the precursor of polyimide resin being kept unchanged, so as to provide significantly reduced dielectric constant and also provide improvement in mechanical strength and heat resistance, and the porous polyimide resin produced in the same producing method. A coating comprising porous polyimide resin is formed by applying resin solution comprising a precursor of polyimide resin and a dispersive compound and then drying a solvent, to form a coating in which the dispersive compound is dispersed in the precursor of polyimide resin; extracting the dispersive compound from the coating for removal to make the precursor of the polyimide resin porous; and imidizing the coating after preheated in a temperature range of 190&#x2013;250&#xb0; C.

Method for producing porous polyimide resin and porous polymide resin

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Osaka, Japan

Naotaka Kinjou