Hitachi-High-Technologies Corporation

Hitachi, Ltd.

Hitachi High-Tech Corporation

Naoshi Itabashi

Masahito Mori

Naoyuki Kofuji

Motohiko Yoshigai

Tsutomu Tetsuka

Tetsuo Ono

Seiichiro Kanno

Yoshimitsu Yanagawa

Sonoko Migitaka

Takayuki Kawahara

Keizo Suzuki

Hiroyuki Kobayashi

Shinichi Tachi

Kazunori Tsujimoto

Kazuyuki Ikenaga

Toshiro Saito

Itaru Yanagi

Ken'etsu Yokogawa

Masatoshi Narahara

Takumi Tandou

Junichi Tanaka

Riichiro Takemura

Hiroyuki Uchiyama

Kenichi Takeda

Hiroyasu Shichi

Hideyuki Kazumi

Masaru Izawa

Atsushi Itou

Hiroki Kawada

Toshio Masuda

Masahiko Ando

Osamu Komuro

Tomohiro Shoji

Kazumichi Imai

Takashi Fujii

Kyoko Imai

Masaru Kurihara

Kenta Imai

Osamu Inoue

Go Miya

Michiru Fujioka

Hideyuki Nagaishi

Kozo Mochiji

Kazutami Tago

Takahide Yokoi

Tsuyoshi Sonehara

Keiichi Kanehori

Go Saito

Rena Akahori

Miyako Matsui

Yukio Ono

Masanori Kadotani

Takahiro Kawasaki

Jiro Yamamoto

Makiko Yoshida

Katsumi Setoguchi

Takashi Takahama

Takamichi Muramatsu

Seiji Yamamoto

Toshiaki Nishida

Satoshi Osabe

Takashi Tsutsumi

Yasunori Goto

While an insulating film having a near-field light generating element placed thereon is being irradiated with light in an electrolytic solution, or after the film that has been irradiated with light is disposed in the electrolytic solution, a first voltage is applied between the two electrodes installed in the electrolytic solution across the film, a second voltage is then applied between the two electrodes, and a value of a current that flows between the two electrodes due to the application of the second voltage is detected. This procedure is stopped when the current value reaches or exceeds a pre-set threshold value, whereby a hole is formed at a desired location in the thin-film.

Hole formation method and measurement device

In order to reduce the cost of producing a spot array substrate and reduce the cost of nucleic acid polymer analysis, a spot array substrate is used which is produced by preparing a resin substratehaving a surface on which an uneven pattern is formed and a plurality of bead sitting positions set in a two-dimensional array within the uneven pattern, and loading surface-modified beads onto the bead sitting positions of the resin substrate.

Spot array substrate, method for producing same, and nucleic acid polymer analysis method and device

To a biomolecule measuring apparatus, a semiconductor sensor for detecting ions generated by a reaction between a biomolecular sample and a reagent is set. The semiconductor sensor has a plurality of cells which are arranged on a semiconductor substrate, and each of which detects ions, and a plurality of readout wires. Each of the plurality of cells has an ISFET which has a floating gate and which detects ions, a first MOSFET Mfor amplifying an output from the ISFET, and a second MOSFET Mwhich selectively transmits an output from the first MOSFET to a corresponding readout wire R. Each of the plurality of cells is provided with a third MOSFET Mwhich generates hot electrons in the ISFET and which injects a charge to the floating gate of the ISFET. Here, the second MOSFET and the third MOSFET are separately controlled.

Biomolecule measuring device

Provided is a biomolecule measuring device capable of effectively reducing measurement noise occurring when measuring a biomolecule sample using a semiconductor sensor. This biomolecule measuring device generates a trigger to react a sample with a reagent after starting to send the reagent onto the semiconductor sensor that detects ion concentration (see FIG.).

The purpose of the present invention is to control, with a simple structure and high accuracy, irradiation of excitation light to a multi-nanopore substrate without interrupting a measurement. Irradiation of excitation light is performed concurrently to at least one nanopore and at least one reference object on a substrate mounted in an observation containerA position irradiated with the excitation light in a measurement sample is calculated on the basis of a signal generated from the reference object detected by a detectorand the measurement and a fixed position control is performed concurrently by performing measurement of the measurement object while a drive control partcontrolling the position of the irradiation of the excitation light to the measurement sample on the basis of the calculation result, whereby an analysis of the measurement sample can be performed in a short time.

Fixed position controller and method

The invention provides a plasma processing apparatus and a dry etching method for etching a multilayered film structure having steps with high accuracy. The plasma processing apparatus comprises a vacuum reactor, a lower electrode placed within a processing chamber of the vacuum reactor and having a wafer to be etched mounted on the upper surface thereof, bias supplying units and for supplying high frequency power for forming a bias potential to the lower electrode, a gas supply means for feeding reactive gas into the processing chamber, an electric field supplying means through for supplying a magnetic field for generating plasma in the processing chamber, and a control unit for controlling the distribution of ion energy in the plasma being incident on the wafer via the high frequency power.

Plasma processing method and plasma processing apparatus

The present invention is intended to provide a method and a device for detecting a biomolecule with high sensitivity and high throughput over a wide dynamic range without requiring concentration adjustments of a sample in advance. The present invention specifically binds charge carriers to a detection target biomolecule, and detects the detection target biomolecule one by one by measuring a current change that occurs as the conjugate of the biomolecule and the charge carriers passes through a micropore. High-throughput detection of a biomolecule sample is possible with an array of detectors.

Biomolecule detection method, biomolecule detection device and analysis device

An object of the present invention is to provide an image processing apparatus that quickly and precisely measures or evaluates a distortion in a field of view and a charged particle beam apparatus. To attain the object, an image processing apparatus or the like is proposed which acquires a first image of a first area of an imaging target and a second image of a second area that is located at a different position than the first area and partially overlaps with the first area and determines the distance between a measurement point in the second image and a second part of the second image that corresponds to a particular area for a plurality of sites in the overlapping area of the first image and the second image.

Image processing device, charged particle beam device, charged particle beam device adjustment sample, and manufacturing method thereof

There is provided a plasma processing apparatus that can generate uniform plasma without increasing costs per unit electric power even though the discharge area is increased to adapt to samples in given sizes by arranging a plurality of plasma discharge units. A plasma processing apparatus includes an RF power supply having an RF signal circuit and an RF power circuit, a case, and a discharge electrode. A plasma module is configured of the discharge electrode and the RF power circuit provided in the case. A frequency signal from the RF signal circuit is inputted to a plurality of the plasma modules connected in parallel with each other.

Plasma processing apparatus

The invention provides a plasma processing apparatus and a dry etching method for etching a multilayered film structure having steps with high accuracy. The plasma processing apparatus comprises a vacuum reactor, a lower electrodeplaced within a processing chamber of the vacuum reactor and having a waferto be etched mounted on the upper surface thereof, bias supplying unitsandfor supplying high frequency power for forming a bias potential to the lower electrode, a gas supply meansfor feeding reactive gas into the processing chamber, an electric field supplying meansthroughfor supplying a magnetic field for generating plasma in the processing chamber, and a control unitfor controlling the distribution of ion energy in the plasma being incident on the wafervia the high frequency power.

Sterilization and cleaning of an escalator hand rail are performed. A sterilization and cleaning device including a hand rail; a plasma source for irradiating the hand rails with ions or radicals or UV light; an enclosure for housing the plasma source; a power source for generating plasma; a fan for generating relatively negative pressure in the enclosure; filter units for removing removed bacteria, viruses, and organic matters such as hand marks; and filter plates located backward and forward of a moving direction of the hand rail in the enclosure along the hand rail is provided.

Plasma sterilization and cleaning treatment device for escalator, and escalator using the same

The invention provides a plasma processing apparatus aimed at suppressing the corrosion caused by reactive gas and heavy-metal contamination caused by plasma damage of components constituting the high-frequency electrode and gas supply unit. The plasma processing apparatus comprises a processing chamberfor subjecting a processing substrateto plasma processing, gas supply meansandfor feeding gas to the processing chamber, and an antenna electrodefor supplying high-frequency radiation for discharging the gas to generate plasma, wherein the gas supply means includes a gas shower platehaving gas discharge holes on the surface exposed to plasma, and a portion of or a whole surface of the conductorexposed to gas constituting the antenna-electrode side of the gas supply means is subjected to ceramic spraying containing no heavy metal to form a protecting film

An object of the present invention relates to distinguishing, from a fluorophore of an unreacted substrate, a single fluorophore attached to a nucleotide that is incorporated into a probe by a nucleic acid synthesis. The present invention relates to a nucleic acid analyzing device that analyzes a nucleic acid in sample by fluorescence, wherein a localized surface plasmon is generated by illumination, and a probe for analyzing the nucleic acid in the sample is on the site where the surface plasmon is generated. According to the present invention, since it is possible to efficiently produce fluorescence intensifying effects due to the surface plasmon and to immobilize the probe to a region within the reach of the fluorescence intensifying effects, it becomes possible to measure a nucleic acid synthesis without removing unreacted nucleotide to which fluorophores are attached.

Nucleic acid analyzing device and nucleic acid analyzer

A plasma processing apparatus including a chamber having an inner wall with a protective film thereon and a sample stage disposed in the chamber in which plasma is generated by supplying high-frequency wave energy to processing gas to conduct plasma processing for a sample on the sample stage using the plasma. The apparatus includes a control device which determines, based on monitor values of a wafer attracting current monitor (Ip) to monitor a current supplied from a wafer attracting power source, an impedance monitor (Zp) to monitor plasma impedance viewed from a plasma generating power source, and an impedance monitor (Zb) to monitor a plasma impedance viewed from a bias power supply, presence or absence of occurrence of an associated one of abnormal discharge in inner parts, deterioration in insulation of an insulating film of a wafer attracting electrode, and abnormal injection in a gas injection plate.

Growing community of inventors

Hachioji, Japan

Naoshi Itabashi