Kabushiki Kaisha Toshiba

Toshiba Electronic Devices & Storage Corporation

Naonori Hosokawa

Akira Yoshioka

Hung Hung

Toru Sugiyama

Masaaki Iwai

Masaaki Onomura

Yasuhiro Isobe

Hitoshi Kobayashi

Tetsuya Ohno

A semiconductor device according to an embodiment includes: a first nitride semiconductor layer having a first surface and a second surface; a first source electrode provided on the first surface; a first drain electrode provided on the first surface; a first gate electrode provided on the first surface between the first source electrode and the first drain electrode; a second nitride semiconductor layer having a third surface and a fourth surface, the third surface being provided on the second surface and facing the second surface, and the second nitride semiconductor layer having a smaller band gap than the first nitride semiconductor layer; and a first semiconductor device having a fifth surface provided on the fourth surface and facing the fourth surface with a size equal to or smaller than a size of the fourth surface, the first semiconductor device including a first semiconductor material having a smaller band gap than the second nitride semiconductor layer.

Semiconductor device

A semiconductor device includes a semiconductor package including an n-type channel normally-off transistor, a normally-on transistor, a first diode, and a Zener diode; a first terminal provided on the semiconductor package; a plurality of second terminals provided on the semiconductor package, and the second terminals being lined up in a first direction; a third terminal provided on the semiconductor package; a plurality of fourth terminals provided on the semiconductor package; and a plurality of fifth terminals provided on the semiconductor package, and the fifth terminals being lined up in the first direction.

Provided is a semiconductor device including a normally-off transistor having a first electrode, a second electrode, and a first control electrode, a normally-on transistor having a third electrode, a fourth electrode, and a second control electrode, a first capacitor having a first end and a second end, a Zener diode having a first anode and a first cathode, a first resistor having a third end and a fourth end, a first diode having a second anode and a second cathode, a second resistor having a fifth end and a sixth end, a second diode having a third anode and a third cathode, and a second capacitor having a seventh end and an eighth end.

A semiconductor device according to embodiments includes a normally-off transistor having a first electrode, a second electrode, and a first control electrode, a normally-on transistor having a third electrode electrically connected to the second electrode, a fourth electrode, and a second control electrode, a first element having a first end portion electrically connected to the first control electrode and a second end portion electrically connected to the first electrode, and the first element including a first capacitance component; and, a second element having a third end portion electrically connected to the first control electrode and the first end portion and a fourth end portion, and the second element including a second capacitance component, wherein, when a threshold voltage of the normally-off transistor is denoted by V, a maximum rated gate voltage of the normally-off transistor is denoted by V, a voltage of the fourth end portion is denoted by V, the first capacitance component is denoted by C, and the second capacitance component is denoted by C, V&#x3c;(C/(C+C))V&#x3c;V.

A semiconductor device of an embodiment includes a first nitride semiconductor layer; a second nitride semiconductor layer placed on the first nitride semiconductor layer; a first electrode placed on the second nitride semiconductor layer; a second electrode placed on the first nitride semiconductor layer; a gate electrode placed between the first electrode and the second electrode; a first field plate electrode placed on the second nitride semiconductor layer, the first field plate electrode having the same height as the gate electrode; and a second field plate electrode provided on an upper side of the first field plate electrode, the second field plate electrode being placed on a side of the second electrode compared to the first field plate electrode.

A semiconductor device includes first and second nitride semiconductor layers, a first electrode electrically connected to the first nitride semiconductor layer, a second electrode electrically connected to the first nitride semiconductor layer, a gate electrode between the first and second electrodes, a first field plate electrode electrically connected to the first electrode, a second field plate electrode between the gate electrode and the second electrode and electrically connected to the first electrode, a first conductive layer on the gate electrode, and a second conductive layer on the first conductive layer. A distance between the gate electrode and the second field plate electrode in a lateral direction is shorter than a distance between the first conductive layer and the second field plate electrode in the lateral direction, and is equal to or shorter than a distance between the second conductive layer and the second field plate electrode.

A semiconductor device of embodiments includes a first normally-off transistor having a first electrode, a second electrode, and a first control electrode, a normally-on transistor having a third electrode electrically connected to the second electrode via a first wiring, a fourth electrode, and a second control electrode, a second normally-off transistor having a fifth electrode, a sixth electrode electrically connected to the third electrode via a second wiring, and a third control electrode, a first diode having a first anode electrically connected to the second control electrode and a first cathode electrically connected to the third electrode, and a capacitor having a first end portion connected to the first anode and the second control electrode and a second end portion.

Growing community of inventors

Yokohama, Japan

Naonori Hosokawa